IPC-Stelle: H05H 7/20 [Version 7 (gültig ab 01.2000)]

SymbolTypTitel
HSKELECTRICITY
H05KLELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H05HUKLPLASMA TECHNIQUE (fusion reactors G21B; ion-beam tubes H01J 27/00; magnetohydrodynamic generators H02K 44/08; producing X-rays involving plasma generation H05G 2/00); PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS (obtaining neutrons from radioactive sources G21 , e.g. G21B , G21C , G21G); PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS (atomic clocks G04F 5/14; devices using stimulated emission H01S; frequency regulation by comparison with a reference frequency determined by energy levels of molecules, atoms, or subatomic particles H03L 7/26)
H05H 1/00HGRGenerating plasma; Handling plasma
H05H 1/02UGR1
.Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma (electron optics H01J)
H05H 1/03UGR2
. .using electrostatic fields [3]
H05H 1/04UGR2
. .using magnetic fields substantially generated by the discharge in the plasma
H05H 1/06UGR3
. . .Longitudinal pinch devices
H05H 1/08UGR3
. . .Theta pinch devices
H05H 1/10UGR2
. .using applied magnetic fields only
H05H 1/11UGR3
. . .using cusp configuration (H05H 1/14 takes precedence) [3]
H05H 1/12UGR3
. . .wherein the containment vessel forms a closed loop, e.g. stellarator
H05H 1/14UGR3
. . .wherein the containment vessel is straight and has magnetic mirrors
H05H 1/16UGR2
. .using applied electric and magnetic fields
H05H 1/18UGR3
. . .wherein the fields oscillate at a very high frequency, e.g. in the microwave range
H05H 1/20UGR2
. .Ohmic heating
H05H 1/22UGR2
. .for injection heating
H05H 1/24UGR1
.Generating plasma [2]
H05H 1/26UGR2
. .Plasma torches [2]
H05H 1/28UGR3
. . .Cooling arrangements [3]
H05H 1/30UGR3
. . .using applied electromagnetic fields, e.g. high-frequency or microwave energy (H05H 1/28 takes precedence) [3]
H05H 1/32UGR3
. . .using an arc (H05H 1/28 takes precedence) [3]
H05H 1/34UGR4
. . . .Details, e.g. electrodes, nozzles [3]
H05H 1/36UGR5
. . . . .Circuit arrangements (H05H 1/38 , H05H 1/40 take precedence) [3]
H05H 1/38UGR5
. . . . .Guiding or centering of electrodes [3]
H05H 1/40UGR5
. . . . .using applied magnetic fields, e.g. for focusing or rotating the arc [3]
H05H 1/42UGR4
. . . .with provisions for introducing materials into the plasma, e.g. powder, liquid (electrostatic spraying, spraying apparatus with means for charging the spray electrically B05B 5/00) [3]
H05H 1/44UGR4
. . . .using more than one torch [3]
H05H 1/46UGR2
. .using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H 1/26 takes precedence) [3]
H05H 1/48UGR2
. .using an arc (H05H 1/26 takes precedence) [3]
H05H 1/50UGR3
. . .and using applied magnetic fields, e.g. for focusing or rotating the arc [3]
H05H 1/52UGR2
. .using exploding wires or spark gaps (H05H 1/26 takes precedence; spark gaps in general H01T) [3]
H05H 1/54UGR1
.Plasma accelerators [3]
H05H 3/00HGRProduction or acceleration of neutral particle beams, e.g. molecular or atomic beams [3]
H05H 3/02UGR1
.Molecular or atomic-beam generation, e.g. resonant beam generation (gas masers H01S 1/06) [3]
H05H 3/04UGR1
.Acceleration by electromagnetic wave pressure [3]
H05H 3/06UGR1
.Generating neutron beams (targets for producing nuclear reactions H05H 6/00; neutron sources G21G 4/02) [5]
H05H 5/00HGRDirect voltage accelerators; Accelerators using single pulses (H05H 3/06 takes precedence) [5]
H05H 5/02UGR1
.Details (targets for producing nuclear reactions H05H 6/00) [3]
H05H 5/03UGR2
. .Accelerating tubes (vessels or containers of electric discharge tubes with improved potential distribution over surface of vessel H01J 5/06; shields of X-ray tubes associated with vessels or containers H01J 35/16) [4]
H05H 5/04UGR1
.energised by electrostatic generators, e.g. by van de Graaff generator [4]
H05H 5/06UGR1
.Tandem accelerators; Multi-stage accelerators
H05H 5/08UGR1
.Particle accelerators using step-up transformers, e.g. resonance transformers [4]
H05H 6/00HGRTargets for producing nuclear reactions (supports for targets or objects to be irradiated G21K 5/08) [3]
H05H 7/00HGRDetails of devices of the types covered by groups H05H 9/00 to H05H 13/00 (targets for producing nuclear reactions H05H 6/00) [3]
H05H 7/02UGR1
.Circuits or systems for supplying or feeding radio-frequency energy (radio-frequency generators H03B)
H05H 7/04UGR1
.Magnet systems; Energisation thereof
H05H 7/06UGR1
.Two-beam arrangements; Multi-beam arrangements
H05H 7/08UGR1
.Arrangements for injecting particles into orbits
H05H 7/10UGR1
.Arrangements for ejecting particles from orbits
H05H 7/12UGR1
.Arrangements for varying final energy of beam
H05H 7/14UGR1
.Vacuum chambers (H05H 5/03 takes precedence) [4]
H05H 7/16UGR2
. .of the waveguide type [4]
H05H 7/18UGR2
. .Cavities; Resonators [4]
H05H 7/20UGR3
. . .with superconductive walls [4]
H05H 7/22UGR1
.Details of linear accelerators, e.g. drift tubes (H05H 7/02 to H05H 7/20 take precedence) [4]
H05H 9/00HGRLinear accelerators (H05H 11/00 takes precedence)
H05H 9/02UGR1
.Travelling-wave linear accelerators
H05H 9/04UGR1
.Standing-wave linear accelerators
H05H 11/00HGRMagnetic induction accelerators, e.g. betatrons
H05H 11/02UGR1
.Air-cored betatrons
H05H 11/04UGR1
.Biased betatrons
H05H 13/00HGRMagnetic resonance accelerators; Cyclotrons
H05H 13/02UGR1
.Synchrocyclotrons, i.e. frequency-modulated cyclotrons
H05H 13/04UGR1
.Synchrotrons
H05H 13/06UGR1
.Air-cored magnetic resonance accelerators
H05H 13/08UGR1
.Alternating-gradient magnetic resonance accelerators
H05H 13/10UGR1
.Accelerators comprising one or more linear accelerating sections and bending magnets or the like to return the charged particles in a trajectory parallel to the first accelerating section, e.g. microtrons [4]
H05H 15/00HGRMethods or devices for acceleration of charged particles not otherwise provided for [4]