IPC-Stelle: G03F 7/105 [Version 2017.01]

SymbolTypTitel
GSKPHYSICS
G03KLPHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY [4]
G03FUKLPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrography, sensitive layers or processes G03G)
G03F 1/00HGROriginals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof [1, 3, 2006.01, 2012.01]
G03F 1/20UGR1
.Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof [2012.01]
G03F 1/22UGR1
.Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultra-violet [EUV] masks; Preparation thereof [2012.01]
G03F 1/24UGR2
. .Reflection masks; Preparation thereof [2012.01]
G03F 1/26UGR1
.Phase shift masks [PSM]; PSM blanks; Preparation thereof [2012.01]
G03F 1/28UGR2
. .with three or more diverse phases on the same PSM; Preparation thereof [2012.01]
G03F 1/29UGR2
. .Rim PSM or outrigger PSM; Preparation thereof [2012.01]
G03F 1/30UGR2
. .Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof [2012.01]
G03F 1/32UGR2
. .Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof [2012.01]
G03F 1/34UGR2
. .Phase-edge PSM, e.g. chromeless PSM; Preparation thereof [2012.01]
G03F 1/36UGR1
.Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes [2012.01]
G03F 1/38UGR1
.Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof [2012.01]
G03F 1/40UGR2
. .Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate [2012.01]
G03F 1/42UGR2
. .Alignment or registration features, e.g. alignment marks on the mask substrates [2012.01]
G03F 1/44UGR2
. .Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales  [2012.01]
G03F 1/46UGR2
. .Antireflective coatings [2012.01]
G03F 1/48UGR2
. .Protective coatings [2012.01]
G03F 1/50UGR1
.Mask blanks not covered by groups G03F 1/20-G03F 1/26; Preparation thereof [2012.01]
G03F 1/52UGR1
.Reflectors [2012.01]
G03F 1/54UGR1
.Absorbers, e.g. opaque materials [2012.01]
G03F 1/56UGR2
. .Organic absorbers, e.g. photo-resists [2012.01]
G03F 1/58UGR2
. .having two or more different absorber layers, e.g. stacked multilayer absorbers [2012.01]
G03F 1/60UGR1
.Substrates [2012.01]
G03F 1/62UGR1
.Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof [2012.01]
G03F 1/64UGR2
. .characterised by the frames, e.g. structure or material thereof [2012.01]
G03F 1/66UGR1
.Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof [2012.01]
G03F 1/68UGR1
.Preparation processes not covered by groups G03F 1/20-G03F 1/50 [2012.01]
G03F 1/70UGR2
. .Adapting basic layout or design of masks to lithographic process requirements, e.g. second iteration correction of mask patterns for imaging [2012.01]
G03F 1/72UGR2
. .Repair or correction of mask defects [2012.01]
G03F 1/74UGR3
. . .by charged particle beam [CPB], e.g. focused ion beam [2012.01]
G03F 1/76UGR2
. .Patterning of masks by imaging [2012.01]
G03F 1/78UGR3
. . .by charged particle beam [CPB], e.g. electron beam [2012.01]
G03F 1/80UGR2
. .Etching [2012.01]
G03F 1/82UGR2
. .Auxiliary processes, e.g. cleaning [2012.01]
G03F 1/84UGR3
. . .Inspecting [2012.01]
G03F 1/86UGR4
. . . .by charged particle beam [CPB] [2012.01]
G03F 1/88UGR1
.prepared by photographic processes for producing originals simulating relief [2012.01]
G03F 1/90UGR1
.prepared by montage processes [2012.01]
G03F 1/92UGR1
.prepared from printing surfaces [2012.01]
G03F 3/00HGRColour separation; Correction of tonal value (photographic copying apparatus in general G03B) [1, 2006.01]
G03F 3/02UGR1
.by retouching [1, 2006.01]
G03F 3/04UGR1
.by photographic means [1, 2006.01]
G03F 3/06UGR2
. .by masking [1, 2006.01]
G03F 3/08UGR1
.by photoelectric means [1, 2006.01]
G03F 3/10UGR1
.Checking the colour or tonal value of separation negatives or positives [1, 2006.01]
G03F 5/00HGRScreening processes; Screens therefor [1, 2006.01]
G03F 5/02UGR1
.by projecting methods (cameras G03B) [1, 2006.01]
G03F 5/04UGR2
. .changing the screen effect [1, 2006.01]
G03F 5/06UGR2
. .changing the diaphragm effect [1, 2006.01]
G03F 5/08UGR2
. .using line screens [1, 2006.01]
G03F 5/10UGR2
. .using cross-line screens [1, 2006.01]
G03F 5/12UGR2
. .using other screens, e.g. granulated screen [1, 2006.01]
G03F 5/14UGR1
.by contact methods [1, 2006.01]
G03F 5/16UGR2
. .using grey half-tone screens [1, 2006.01]
G03F 5/18UGR2
. .using colour half-tone screens [1, 2006.01]
G03F 5/20UGR1
.using screens for gravure printing [1, 2006.01]
G03F 5/22UGR1
.combining several screens; Elimination of moire [1, 2006.01]
G03F 5/24UGR1
.by multiple exposure, e.g. combined processes for line photo and screen [1, 2006.01]
G03F 7/00HGRPhotomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L 21/00, H05K) [1, 3, 5, 2006.01]
G03F 7/004UGR1
.Photosensitive materials (G03F 7/12, G03F 7/14 take precedence) [5, 2006.01]
G03F 7/008UGR2
. .Azides (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/012UGR3
. . .Macromolecular azides; Macromolecular additives, e.g. binders [5, 2006.01]
G03F 7/016UGR2
. .Diazonium salts or compounds (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/021UGR3
. . .Macromolecular diazonium compounds; Macromolecular additives, e.g. binders [5, 2006.01]
G03F 7/022UGR2
. .Quinonediazides (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/023UGR3
. . .Macromolecular quinonediazides; Macromolecular additives, e.g. binders [5, 2006.01]
G03F 7/025UGR2
. .Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/027UGR2
. .Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/028UGR3
. . .with photosensitivity-increasing substances, e.g. photoinitiators [5, 2006.01]
G03F 7/029UGR4
. . . .Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur [5, 2006.01]
G03F 7/031UGR4
. . . .Organic compounds not covered by group G03F 7/029 [5, 2006.01]
G03F 7/032UGR3
. . .with binders [5, 2006.01]
G03F 7/033UGR4
. . . .the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers [5, 2006.01]
G03F 7/035UGR4
. . . .the binders being polyurethanes [5, 2006.01]
G03F 7/037UGR4
. . . .the binders being polyamides or polyimides [5, 2006.01]
G03F 7/038UGR2
. .Macromolecular compounds which are rendered insoluble or differentially wettable (G03F 7/075 takes precedence; macromolecular azides G03F 7/012; macromolecular diazonium compounds G03F 7/021) [5, 2006.01]
G03F 7/039UGR2
. .Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F 7/075 takes precedence; macromolecular quinonediazides G03F 7/023) [5, 2006.01]
G03F 7/04UGR2
. .Chromates (G03F 7/075 takes precedence) [1, 5, 2006.01]
G03F 7/06UGR2
. .Silver salts (G03F 7/075 takes precedence) [1, 5, 2006.01]
G03F 7/07UGR3
. . .used for diffusion transfer [5, 2006.01]
G03F 7/075UGR2
. .Silicon-containing compounds [5, 2006.01]
G03F 7/085UGR2
. .Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/09UGR2
. .characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B41N) [5, 2006.01]
G03F 7/095UGR3
. . .having more than one photosensitive layer (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/105UGR3
. . .having substances, e.g. indicators, for forming visible images [5, 2006.01]
G03F 7/11UGR3
. . .having cover layers or intermediate layers, e.g. subbing layers [5, 2006.01]
G03F 7/115UGR3
. . .having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing [5, 2006.01]
G03F 7/12UGR1
.Production of screen printing forms or similar printing forms, e.g. stencils [1, 2006.01]
G03F 7/14UGR1
.Production of collotype printing forms [1, 2006.01]
G03F 7/16UGR1
.Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to the base for photographic purposes G03C 1/74) [1, 2006.01]
G03F 7/18UGR2
. .Coating curved surfaces [1, 2006.01]
G03F 7/20UGR1
.Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B 27/00) [1, 4, 2006.01]
G03F 7/207UGR2
. .Means for focusing, e.g. automatically (combination of positioning and focusing G03F 9/02; systems for automatic generation of focusing signals in general G02B 7/28; means for automatic focusing of projection printing apparatus G03B 27/34) [4, 2006.01]
G03F 7/213UGR2
. .Exposing with the same light pattern different positions of the same surface at the same time (G03F 7/207 takes precedence) [4, 2006.01]
G03F 7/22UGR2
. .Exposing sequentially with the same light pattern different positions of the same surface (G03F 7/207 takes precedence) [1, 4, 2006.01]
G03F 7/23UGR3
. . .Automatic means therefor [4, 2006.01]
G03F 7/24UGR2
. .Curved surfaces [1, 2006.01]
G03F 7/26UGR1
.Processing photosensitive materials; Apparatus therefor (G03F 7/12-G03F 7/24 take precedence) [3, 5, 2006.01]
G03F 7/28UGR2
. .for obtaining powder images (G03F 3/10 takes precedence) [5, 2006.01]
G03F 7/30UGR2
. .Imagewise removal using liquid means [5, 2006.01]
G03F 7/32UGR3
. . .Liquid compositions therefor, e.g. developers [5, 2006.01]
G03F 7/34UGR2
. .Imagewise removal by selective transfer, e.g. peeling away [5, 2006.01]
G03F 7/36UGR2
. .Imagewise removal not covered by groups G03F 7/30-G03F 7/34, e.g. using gas streams, using plasma [5, 2006.01]
G03F 7/38UGR2
. .Treatment before imagewise removal, e.g. prebaking [5, 2006.01]
G03F 7/40UGR2
. .Treatment after imagewise removal, e.g. baking [5, 2006.01]
G03F 7/42UGR2
. .Stripping or agents therefor [5, 2006.01]
G03F 9/00HGRRegistration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F 7/22 takes precedence; preparation of photographic masks G03F 1/00; within photographic printing apparatus for making copies G03B 27/00) [1, 4, 2006.01]
G03F 9/02UGR1
.combined with means for automatic focusing (automatic focusing in general G02B 7/09; systems for automatic generation of focusing signals G02B 7/28) [4, 2006.01]