IPC-Stelle: G03F 7/095 [Version 2006.01]

SymbolTypTitel
GSKSECTION G — PHYSICS
G03KLPHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY (reproduction of pictures or patterns by scanning and converting into electrical signals H04N) [4]
G03FUKLPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrography, sensitive layers or processes G03G)
G03F 1/00HGRPreparation of originals for the photomechanical production of textured or patterned surfaces (photomechanical processes in general G03F 7/00) [3]
G03F 1/02UGR1
.by photographic processes for production of originals simulating relief
G03F 1/04UGR1
.by montage processes
G03F 1/06UGR1
.from printing surfaces [5]
G03F 1/08UGR1
.Originals having inorganic imaging layers, e.g. chrome masks (G03F 1/12 takes precedence) [5]
G03F 1/10UGR1
.by exposing and washing out pigmented or coloured organic layers; by colouring macromolecular patterns [5]
G03F 1/12UGR1
.by exposing silver-halide-containing photosensitive materials or diazo-type photosensitive materials [5]
G03F 1/14UGR1
.Originals characterised by structural details, e.g. supports, cover layers, pellicle rings [5]
G03F 1/16UGR1
.Originals having apertures, e.g. for corpuscular lithography [5]
G03F 3/00HGRColour separation; Correction of tonal value (photographic copying apparatus in general G03B)
G03F 3/02UGR1
.by retouching
G03F 3/04UGR1
.by photographic means
G03F 3/06UGR2
. .by masking
G03F 3/08UGR1
.by photoelectric means
G03F 3/10UGR1
.Checking the colour or tonal value of separation negatives or positives
G03F 5/00HGRScreening processes; Screens therefor
G03F 5/02UGR1
.by projecting methods (cameras G03B)
G03F 5/04UGR2
. .changing the screen effect
G03F 5/06UGR2
. .changing the diaphragm effect
G03F 5/08UGR2
. .using line screens
G03F 5/10UGR2
. .using cross-line screens
G03F 5/12UGR2
. .using other screens, e.g. granulated screen
G03F 5/14UGR1
.by contact methods
G03F 5/16UGR2
. .using grey half-tone screens
G03F 5/18UGR2
. .using colour half-tone screens
G03F 5/20UGR1
.using screens for gravure printing
G03F 5/22UGR1
.combining several screens; Elimination of moire
G03F 5/24UGR1
.by multiple exposure, e.g. combined processes for line photo and screen
G03F 7/00HGRPhotomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L 21/00, H05K) [3, 5]
G03F 7/004UGR1
.Photosensitive materials (G03F 7/12, G03F 7/14 take precedence) [5]
G03F 7/008UGR2
. .Azides (G03F 7/075 takes precedence) [5]
G03F 7/012UGR3
. . .Macromolecular azides; Macromolecular additives, e.g. binders [5]
G03F 7/016UGR2
. .Diazonium salts or compounds (G03F 7/075 takes precedence) [5]
G03F 7/021UGR3
. . .Macromolecular diazonium compounds; Macromolecular additives, e.g. binders [5]
G03F 7/022UGR2
. .Quinonediazides (G03F 7/075 takes precedence) [5]
G03F 7/023UGR3
. . .Macromolecular quinonediazides; Macromolecular additives, e.g. binders [5]
G03F 7/025UGR2
. .Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds (G03F 7/075 takes precedence) [5]
G03F 7/027UGR2
. .Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F 7/075 takes precedence) [5]
G03F 7/028UGR3
. . .with photosensitivity-increasing substances, e.g. photoinitiators [5]
G03F 7/029UGR4
. . . .Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur [5]
G03F 7/031UGR4
. . . .Organic compounds not covered by group G03F 7/029 [5]
G03F 7/032UGR3
. . .with binders [5]
G03F 7/033UGR4
. . . .the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers [5]
G03F 7/035UGR4
. . . .the binders being polyurethanes [5]
G03F 7/037UGR4
. . . .the binders being polyamides or polyimides [5]
G03F 7/038UGR2
. .Macromolecular compounds which are rendered insoluble or differentially wettable (G03F 7/075 takes precedence; macromolecular azides G03F 7/012; macromolecular diazonium compounds G03F 7/021) [5]
G03F 7/039UGR2
. .Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F 7/075 takes precedence; macromolecular quinonediazides G03F 7/023) [5]
G03F 7/04UGR2
. .Chromates (G03F 7/075 takes precedence) [5]
G03F 7/06UGR2
. .Silver salts (G03F 7/075 takes precedence) [5]
G03F 7/07UGR3
. . .used for diffusion transfer [5]
G03F 7/075UGR2
. .Silicon-containing compounds [5]
G03F 7/085UGR2
. .Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives (G03F 7/075 takes precedence) [5]
G03F 7/09UGR2
. .characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B41N) [5]
G03F 7/095UGR3
. . .having more than one photosensitive layer (G03F 7/075 takes precedence) [5]
G03F 7/105UGR3
. . .having substances, e.g. indicators, for forming visible images [5]
G03F 7/11UGR3
. . .having cover layers or intermediate layers, e.g. subbing layers [5]
G03F 7/115UGR3
. . .having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing [5]
G03F 7/12UGR1
.Production of screen printing forms or similar printing forms, e.g. stencils
G03F 7/14UGR1
.Production of collotype printing forms
G03F 7/16UGR1
.Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to the base for photographic purposes G03C 1/74)
G03F 7/18UGR2
. .Coating curved surfaces
G03F 7/20UGR1
.Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B 27/00) [4]
G03F 7/207UGR2
. .Means for focusing, e.g. automatically (combination of positioning and focusing G03F 9/02; systems for automatic generation of focusing signals in general G02B 7/28; means for automatic focusing of projection printing apparatus G03B 27/34) [4]
G03F 7/213UGR2
. .Exposing with the same light pattern different positions of the same surface at the same time (G03F 7/207 takes precedence) [4]
G03F 7/22UGR2
. .Exposing sequentially with the same light pattern different positions of the same surface (G03F 7/207 takes precedence) [4]
G03F 7/23UGR3
. . .Automatic means therefor [4]
G03F 7/24UGR2
. .Curved surfaces
G03F 7/26UGR1
.Processing photosensitive materials; Apparatus therefor (G03F 7/12-G03F 7/24 take precedence) [3, 5]
G03F 7/28UGR2
. .for obtaining powder images (G03F 3/10 takes precedence) [5]
G03F 7/30UGR2
. .Imagewise removal using liquid means [5]
G03F 7/32UGR3
. . .Liquid compositions therefor, e.g. developers [5]
G03F 7/34UGR2
. .Imagewise removal by selective transfer, e.g. peeling away [5]
G03F 7/36UGR2
. .Imagewise removal not covered by groups G03F 7/30-G03F 7/34, e.g. using gas streams, using plasma [5]
G03F 7/38UGR2
. .Treatment before imagewise removal, e.g. prebaking [5]
G03F 7/40UGR2
. .Treatment after imagewise removal, e.g. baking [5]
G03F 7/42UGR2
. .Stripping or agents therefor [5]
G03F 9/00HGRRegistration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F 7/22 takes precedence; preparation of photographic masks G03F 1/00; within photographic printing apparatus for making copies G03B 27/00) [4]
G03F 9/02UGR1
.combined with means for automatic focusing (automatic focusing in general G02B 7/09; systems for automatic generation of focusing signals G02B 7/28) [4]