C | SK | CHEMISTRY; METALLURGY |
C23 | KL | COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL [2] |
C23F | UKL | NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES (working of metal by electro-erosion B23H; desurfacing by applying flames B23K 7/00; working metal by laser beam B23K 26/00); INHIBITING CORROSION OF METALLIC MATERIAL; INHIBITING INCRUSTATION IN GENERAL (treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D, C25F); MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 [4] |
C23F 1/00 | HGR | Etching metallic material by chemical means [1, 2, 2006.01] |
C23F 1/02 | UGR1 | . | Local etching [1, 2006.01] |
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C23F 1/04 | UGR2 | . . | Chemical milling [1, 2006.01] |
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C23F 1/06 | UGR1 | . | Sharpening files [1, 2006.01] |
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C23F 1/08 | UGR1 | . | Apparatus, e.g. for photomechanical printing surfaces [1, 2006.01] |
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C23F 1/10 | UGR1 | . | Etching compositions (C23F 1/44 takes precedence) [4, 2006.01] |
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C23F 1/12 | UGR2 | . . | Gaseous compositions [4, 2006.01] |
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C23F 1/14 | UGR2 | . . | Aqueous compositions [4, 2006.01] |
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C23F 1/16 | UGR3 | . . . | Acidic compositions (C23F 1/42 takes precedence) [4, 2006.01] |
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C23F 1/18 | UGR4 | . . . . | for etching copper or alloys thereof [4, 2006.01] |
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C23F 1/20 | UGR4 | . . . . | for etching aluminium or alloys thereof [4, 2006.01] |
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C23F 1/22 | UGR4 | . . . . | for etching magnesium or alloys thereof [4, 2006.01] |
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C23F 1/24 | UGR4 | . . . . | for etching silicon or germanium [4, 2006.01] |
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C23F 1/26 | UGR4 | . . . . | for etching refractory metals [4, 2006.01] |
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C23F 1/28 | UGR4 | . . . . | for etching iron group metals [4, 2006.01] |
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C23F 1/30 | UGR4 | . . . . | for etching other metallic material [4, 2006.01] |
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C23F 1/32 | UGR3 | . . . | Alkaline compositions (C23F 1/42 takes precedence) [4, 2006.01] |
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C23F 1/34 | UGR4 | . . . . | for etching copper or alloys thereof [4, 2006.01] |
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C23F 1/36 | UGR4 | . . . . | for etching aluminium or alloys thereof [4, 2006.01] |
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C23F 1/38 | UGR4 | . . . . | for etching refractory metals [4, 2006.01] |
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C23F 1/40 | UGR4 | . . . . | for etching other metallic material [4, 2006.01] |
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C23F 1/42 | UGR3 | . . . | containing a dispersed water-immiscible liquid [4, 2006.01] |
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C23F 1/44 | UGR1 | . | Compositions for etching metallic material from a metallic material substrate of different composition [4, 2006.01] |
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C23F 1/46 | UGR1 | . | Regeneration of etching compositions [4, 2006.01] |
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C23F 3/00 | HGR | Brightening metals by chemical means [1, 2, 2006.01] |
C23F 3/02 | UGR1 | . | Light metals [1, 2006.01] |
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C23F 3/03 | UGR2 | . . | with acidic solutions [4, 2006.01] |
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C23F 3/04 | UGR1 | . | Heavy metals [1, 2006.01] |
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C23F 3/06 | UGR2 | . . | with acidic solutions [4, 2006.01] |
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C23F 4/00 | HGR | Processes for removing metallic material from surfaces, not provided for in group C23F 1/00 or C23F 3/00 [4, 2006.01] |
C23F 4/02 | UGR1 | . | by evaporation [4, 2006.01] |
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C23F 4/04 | UGR1 | . | by physical dissolution [4, 2006.01] |
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C23F 11/00 | HGR | Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent [1, 2006.01] |
C23F 11/02 | UGR1 | . | in air or gases by adding vapour phase inhibitors [1, 2006.01] |
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C23F 11/04 | UGR1 | . | in markedly acid liquids [1, 2006.01] |
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C23F 11/06 | UGR1 | . | in markedly alkaline liquids [1, 2006.01] |
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C23F 11/08 | UGR1 | . | in other liquids [1, 2006.01] |
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C23F 11/10 | UGR2 | . . | using organic inhibitors [1, 2006.01] |
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C23F 11/12 | UGR3 | . . . | Oxygen-containing compounds [1, 2006.01] |
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C23F 11/14 | UGR3 | . . . | Nitrogen-containing compounds [1, 2006.01] |
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C23F 11/16 | UGR3 | . . . | Sulfur-containing compounds [1, 2006.01] |
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C23F 11/167 | UGR3 | . . . | Phosphorus-containing compounds [4, 2006.01] |
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C23F 11/173 | UGR3 | . . . | Macromolecular compounds [4, 2006.01] |
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C23F 11/18 | UGR2 | . . | using inorganic inhibitors [1, 2006.01] |
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C23F 13/00 | HGR | Inhibiting corrosion of metals by anodic or cathodic protection [1, 2006.01] |
C23F 13/02 | UGR1 | . | cathodic; Selection of conditions, parameters or procedures for cathodic protection, e.g. of electrical conditions [5, 2006.01] |
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C23F 13/04 | UGR2 | . . | Controlling or regulating desired parameters [5, 2006.01] |
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C23F 13/06 | UGR2 | . . | Constructional parts, or assemblies of cathodic-protection apparatus [5, 2006.01] |
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C23F 13/08 | UGR3 | . . . | Electrodes specially adapted for inhibiting corrosion by cathodic protection; Manufacture thereof; Conducting electric current thereto [5, 2006.01] |
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C23F 13/10 | UGR4 | . . . . | Electrodes characterised by the structure (C23F 13/16 takes precedence) [5, 2006.01] |
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C23F 13/12 | UGR4 | . . . . | Electrodes characterised by the material (C23F 13/16 takes precedence) [5, 2006.01] |
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C23F 13/14 | UGR5 | . . . . . | Material for sacrificial anodes [5, 2006.01] |
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C23F 13/16 | UGR4 | . . . . | Electrodes characterised by the combination of the structure and the material [5, 2006.01] |
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C23F 13/18 | UGR4 | . . . . | Means for supporting electrodes [5, 2006.01] |
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C23F 13/20 | UGR4 | . . . . | Conducting electric current to electrodes [5, 2006.01] |
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C23F 13/22 | UGR4 | . . . . | Monitoring arrangements therefor [5, 2006.01] |
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C23F 14/00 | HGR | Inhibiting incrustation in apparatus for heating liquids for physical or chemical purposes (adding scale preventives or removers to water C02F 5/00) [1, 2, 2006.01] |
C23F 14/02 | UGR1 | . | by chemical means [1, 2006.01] |
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C23F 15/00 | HGR | Other methods of preventing corrosion or incrustation [1, 2006.01] |
C23F 17/00 | HGR | Multi-step processes for surface treatment of metallic material involving at least one process provided for in class C23 and at least one process covered by subclass C21D or C22F or class C25 (C23C 28/00 takes precedence) [1, 4, 2006.01] |