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Symbol IPC-Stellen auswählen Titel
A
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HUMAN NECESSITIES
B
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PERFORMING OPERATIONSTRANSPORTING
C
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CHEMISTRYMETALLURGY
D
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TEXTILESPAPER
E
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FIXED CONSTRUCTIONS
F
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MECHANICAL ENGINEERINGLIGHTINGHEATINGWEAPONSBLASTING
G
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PHYSICS
G01
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MEASURINGTESTING
G02
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OPTICS
G03
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PHOTOGRAPHYCINEMATOGRAPHYANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVESELECTROGRAPHYHOLOGRAPHY [4]
G03B
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APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEMAPPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVESACCESSORIES THEREFOR (optical parts of such apparatus G02B; photosensitive materials or processes for photographic purposes G03C; apparatus for processing exposed photographic materials G03D) [4]
G03C
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PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSESPHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR OR STEREO-PHOTOGRAPHIC PROCESSESAUXILIARY PROCESSES IN PHOTOGRAPHY (photographic processes characterised by the use or manipulation of apparatus classifiable per se in subclass G03B, seeG03B)
G03D
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APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALSACCESSORIES THEREFOR
G03F
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PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICESMATERIALS THEREFORORIGINALS THEREFORAPPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrography, sensitive layers or processes G03G)
G03F 1/00
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Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticlesMask blanks or pellicles thereforContainers specially adapted thereforPreparation thereof [1, 3, 2006.01, 2012.01]
G03F 3/00
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Colour separationCorrection of tonal value (photographic copying apparatus in general G03B) [1, 2006.01]
G03F 5/00
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Screening processesScreens therefor [1, 2006.01]
G03F 7/00
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Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfacesMaterials therefor, e.g. comprising photoresistsApparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L 21/00, H05K) [1, 3, 5, 2006.01]
G03F 7/004
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Photosensitive materials (G03F 7/12, G03F 7/14 take precedence) [5, 2006.01]
G03F 7/008
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. . Azides (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/012
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. . . Macromolecular azidesMacromolecular additives, e.g. binders [5, 2006.01]
G03F 7/016
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. . Diazonium salts or compounds (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/021
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. . . Macromolecular diazonium compoundsMacromolecular additives, e.g. binders [5, 2006.01]
G03F 7/022
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. . Quinonediazides (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/023
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. . . Macromolecular quinonediazidesMacromolecular additives, e.g. binders [5, 2006.01]
G03F 7/025
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. . Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/027
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. . Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/028
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. . . with photosensitivity-increasing substances, e.g. photoinitiators [5, 2006.01]
G03F 7/029
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. . . . Inorganic compoundsOnium compoundsOrganic compounds having hetero atoms other than oxygen, nitrogen or sulfur [5, 2006.01]
G03F 7/031
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. . . . Organic compounds not covered by group G03F 7/029 [5, 2006.01]
G03F 7/032
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. . . with binders [5, 2006.01]
G03F 7/033
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. . . . the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers [5, 2006.01]
G03F 7/035
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. . . . the binders being polyurethanes [5, 2006.01]
G03F 7/037
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. . . . the binders being polyamides or polyimides [5, 2006.01]
G03F 7/038
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. . Macromolecular compounds which are rendered insoluble or differentially wettable (G03F 7/075 takes precedence; macromolecular azides G03F 7/012; macromolecular diazonium compounds G03F 7/021) [5, 2006.01]
G03F 7/039
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. . Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F 7/075 takes precedence; macromolecular quinonediazides G03F 7/023) [5, 2006.01]
G03F 7/04
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. . Chromates (G03F 7/075 takes precedence) [1, 5, 2006.01]
G03F 7/06
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. . Silver salts (G03F 7/075 takes precedence) [1, 5, 2006.01]
G03F 7/07
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. . . used for diffusion transfer [5, 2006.01]
G03F 7/075
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. . Silicon-containing compounds [5, 2006.01]
G03F 7/085
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. . Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/09
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. . characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B41N) [5, 2006.01]
G03F 7/095
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. . . having more than one photosensitive layer (G03F 7/075 takes precedence) [5, 2006.01]
G03F 7/105
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. . . having substances, e.g. indicators, for forming visible images [5, 2006.01]
G03F 7/11
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. . . having cover layers or intermediate layers, e.g. subbing layers [5, 2006.01]
G03F 7/115
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. . . having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing [5, 2006.01]
G03F 7/12
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Production of screen printing forms or similar printing forms, e.g. stencils [1, 2006.01]
G03F 7/14
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Production of collotype printing forms [1, 2006.01]
G03F 7/16
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Coating processesApparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to the base for photographic purposes G03C 1/74) [1, 2006.01]
G03F 7/18
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. . Coating curved surfaces [1, 2006.01]
G03F 7/20
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ExposureApparatus therefor (photographic printing apparatus for making copies G03B 27/00) [1, 4, 2006.01]
G03F 7/207
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. . Means for focusing, e.g. automatically (combination of positioning and focusing G03F 9/02; systems for automatic generation of focusing signals in general G02B 7/28; means for automatic focusing of projection printing apparatus G03B 27/34) [4, 2006.01]
G03F 7/213
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. . Exposing with the same light pattern different positions of the same surface at the same time (G03F 7/207 takes precedence) [4, 2006.01]
G03F 7/22
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. . Exposing sequentially with the same light pattern different positions of the same surface (G03F 7/207 takes precedence) [1, 4, 2006.01]
G03F 7/23
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. . . Automatic means therefor [4, 2006.01]
G03F 7/24
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. . Curved surfaces [1, 2006.01]
G03F 7/26
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Processing photosensitive materialsApparatus therefor (G03F 7/12-G03F 7/24 take precedence) [3, 5, 2006.01]
G03F 7/28
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. . for obtaining powder images (G03F 3/10 takes precedence) [5, 2006.01]
G03F 7/30
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. . Imagewise removal using liquid means [5, 2006.01]
G03F 7/32
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. . . Liquid compositions therefor, e.g. developers [5, 2006.01]
G03F 7/34
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. . Imagewise removal by selective transfer, e.g. peeling away [5, 2006.01]
G03F 7/36
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. . Imagewise removal not covered by groups G03F 7/30-G03F 7/34, e.g. using gas streams, using plasma [5, 2006.01]
G03F 7/38
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. . Treatment before imagewise removal, e.g. prebaking [5, 2006.01]
G03F 7/40
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. . Treatment after imagewise removal, e.g. baking [5, 2006.01]
G03F 7/42
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. . Stripping or agents therefor [5, 2006.01]
G03F 9/00
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Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F 7/22 takes precedence; preparation of photographic masks G03F 1/00; within photographic printing apparatus for making copies G03B 27/00) [1, 4, 2006.01]
G03G
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ELECTROGRAPHYELECTROPHOTOGRAPHYMAGNETOGRAPHY (information storage based on relative movement between record carrier and transducer G11B; static stores with means for writing-in or reading-out information G11C; recording of television signals H04N 5/76)
G03H
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HOLOGRAPHIC PROCESSES OR APPARATUS (holograms, e.g. point holograms, used as ordinary optical elements G02B 5/32; analogue computers performing mathematical operations with the aid of optical elements G06E 3/00; holographic storage G11B 7/0065, G11C 13/04) [2]
G04
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HOROLOGY
G05
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CONTROLLINGREGULATING
G06
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COMPUTINGCALCULATING OR COUNTING
G07
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CHECKING-DEVICES
G08
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SIGNALLING
G09
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EDUCATINGCRYPTOGRAPHYDISPLAYADVERTISINGSEALS
G10
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MUSICAL INSTRUMENTSACOUSTICS
G11
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INFORMATION STORAGE
G12
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INSTRUMENT DETAILS
G16
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INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS [2018.01]
G21
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NUCLEAR PHYSICSNUCLEAR ENGINEERING
G99
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SUBJECT MATTER NOT OTHERWISE PROVIDED FOR IN THIS SECTION [2006.01]
H
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ELECTRICITY

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