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IPC-Stelle: G03F 1/36 1-Punkt Untergruppe [Version 2024.01 (aktuell), Sprache EN - English]

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Hierarchielinien

DEKLA-Gruppen

Symbol		Titel
A Hierarchieinformationen		HUMAN NECESSITIES
B Hierarchieinformationen		PERFORMING OPERATIONS; TRANSPORTING
C Hierarchieinformationen		CHEMISTRY; METALLURGY
D Hierarchieinformationen		TEXTILES; PAPER
E Hierarchieinformationen		FIXED CONSTRUCTIONS
F Hierarchieinformationen		MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
G Hierarchieinformationen		PHYSICS
G01 Hierarchieinformationen		MEASURING; TESTING
G02 Hierarchieinformationen		OPTICS
G03 Hierarchieinformationen		PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY [4]
G03B Hierarchieinformationen		APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR (optical parts of such apparatus G02B; photosensitive materials or processes for photographic purposes G03C; apparatus for processing exposed photographic materials G03D) [4]
G03C Hierarchieinformationen		PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR OR STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY (photographic processes characterised by the use or manipulation of apparatus classifiable per se in subclass G03B, seeG03B)
G03D Hierarchieinformationen		APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
G03F Hierarchieinformationen		PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrography, sensitive layers or processes G03G)
G03F 1/00 Hierarchieinformationen		Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof [1, 3, 2006.01, 2012.01]
G03F 1/20 Hierarchieinformationen		. Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof [2012.01]
G03F 1/22 Hierarchieinformationen		. Masks or mask blanks for imaging by radiation of 100 nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof [2012.01]
G03F 1/24 Hierarchieinformationen		. . Reflection masks; Preparation thereof [2012.01]
G03F 1/26 Hierarchieinformationen		. Phase shift masks [PSM]; PSM blanks; Preparation thereof [2012.01]
G03F 1/28 Hierarchieinformationen		. . with three or more diverse phases on the same PSM; Preparation thereof [2012.01]
G03F 1/29 Hierarchieinformationen		. . Rim PSM or outrigger PSM; Preparation thereof [2012.01]
G03F 1/30 Hierarchieinformationen		. . Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof [2012.01]
G03F 1/32 Hierarchieinformationen		. . Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof [2012.01]
G03F 1/34 Hierarchieinformationen		. . Phase-edge PSM, e.g. chromeless PSM; Preparation thereof [2012.01]
G03F 1/36 Hierarchieinformationen		. Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes [2012.01]
G03F 1/38 Hierarchieinformationen		. Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof [2012.01]
G03F 1/40 Hierarchieinformationen		. . Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate [2012.01]
G03F 1/42 Hierarchieinformationen		. . Alignment or registration features, e.g. alignment marks on the mask substrates [2012.01]
G03F 1/44 Hierarchieinformationen		. . Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales [2012.01]
G03F 1/46 Hierarchieinformationen		. . Antireflective coatings [2012.01]
G03F 1/48 Hierarchieinformationen		. . Protective coatings [2012.01]
G03F 1/50 Hierarchieinformationen		. Mask blanks not covered by groups G03F 1/20-G03F 1/26; Preparation thereof [2012.01]
G03F 1/52 Hierarchieinformationen		. Reflectors [2012.01]
G03F 1/54 Hierarchieinformationen		. Absorbers, e.g. opaque materials [2012.01]
G03F 1/56 Hierarchieinformationen		. . Organic absorbers, e.g. photo-resists [2012.01]
G03F 1/58 Hierarchieinformationen		. . having two or more different absorber layers, e.g. stacked multilayer absorbers [2012.01]
G03F 1/60 Hierarchieinformationen		. Substrates [2012.01]
G03F 1/62 Hierarchieinformationen		. Pellicles or pellicle assemblies, e.g. having membrane on support frame; Preparation thereof [2012.01]
G03F 1/64 Hierarchieinformationen		. . characterised by the frames, e.g. structure or material thereof [2012.01]
G03F 1/66 Hierarchieinformationen		. Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof [2012.01]
G03F 1/68 Hierarchieinformationen		. Preparation processes not covered by groups G03F 1/20-G03F 1/50 [2012.01]
G03F 1/70 Hierarchieinformationen		. . Adapting basic layout or design of masks to lithographic process requirements, e.g. second iteration correction of mask patterns for imaging [2012.01]
G03F 1/72 Hierarchieinformationen		. . Repair or correction of mask defects [2012.01]
G03F 1/74 Hierarchieinformationen		. . . by charged particle beam [CPB], e.g. focused ion beam [2012.01]
G03F 1/76 Hierarchieinformationen		. . Patterning of masks by imaging [2012.01]
G03F 1/78 Hierarchieinformationen		. . . by charged particle beam [CPB], e.g. electron beam [2012.01]
G03F 1/80 Hierarchieinformationen		. . Etching [2012.01]
G03F 1/82 Hierarchieinformationen		. . Auxiliary processes, e.g. cleaning [2012.01]
G03F 1/84 Hierarchieinformationen		. . . Inspecting [2012.01]
G03F 1/86 Hierarchieinformationen		. . . . by charged particle beam [CPB] [2012.01]
G03F 1/88 Hierarchieinformationen		. prepared by photographic processes for producing originals simulating relief [2012.01]
G03F 1/90 Hierarchieinformationen		. prepared by montage processes [2012.01]
G03F 1/92 Hierarchieinformationen		. prepared from printing surfaces [2012.01]
G03F 3/00 Hierarchieinformationen		Colour separation; Correction of tonal value (photographic copying apparatus in general G03B) [1, 2006.01]
G03F 5/00 Hierarchieinformationen		Screening processes; Screens therefor [1, 2006.01]
G03F 7/00 Hierarchieinformationen		Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L 21/00, H05K) [1, 3, 5, 2006.01]
G03F 9/00 Hierarchieinformationen		Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F 7/22 takes precedence; preparation of photographic masks G03F 1/00; within photographic printing apparatus for making copies G03B 27/00) [1, 4, 2006.01]
G03G Hierarchieinformationen		ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY (information storage based on relative movement between record carrier and transducer G11B; static stores with means for writing-in or reading-out information G11C; recording of television signals H04N 5/76)
G03H Hierarchieinformationen		HOLOGRAPHIC PROCESSES OR APPARATUS (holograms, e.g. point holograms, used as ordinary optical elements G02B 5/32; analogue computers performing mathematical operations with the aid of optical elements G06E 3/00; holographic storage G11B 7/0065, G11C 13/04) [2]
G04 Hierarchieinformationen		HOROLOGY
G05 Hierarchieinformationen		CONTROLLING; REGULATING
G06 Hierarchieinformationen		COMPUTING; CALCULATING OR COUNTING
G07 Hierarchieinformationen		CHECKING-DEVICES
G08 Hierarchieinformationen		SIGNALLING
G09 Hierarchieinformationen		EDUCATING; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
G10 Hierarchieinformationen		MUSICAL INSTRUMENTS; ACOUSTICS
G11 Hierarchieinformationen		INFORMATION STORAGE
G12 Hierarchieinformationen		INSTRUMENT DETAILS
G16 Hierarchieinformationen		INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR SPECIFIC APPLICATION FIELDS [2018.01]
G21 Hierarchieinformationen		NUCLEAR PHYSICS; NUCLEAR ENGINEERING
G99 Hierarchieinformationen		SUBJECT MATTER NOT OTHERWISE PROVIDED FOR IN THIS SECTION [2006.01]
H Hierarchieinformationen		ELECTRICITY

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