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IPC entry: C23C 16/40 3-dot subgroup [Version 2024.01 (current), Language EN - English]

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Symbol		Title
A		HUMAN NECESSITIES
B		PERFORMING OPERATIONS; TRANSPORTING
C		CHEMISTRY; METALLURGY
C01		CHEMISTRY
C01		INORGANIC CHEMISTRY
C02		TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
C03		GLASS; MINERAL OR SLAG WOOL
C04		CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES [4]
C05		FERTILISERS; MANUFACTURE THEREOF [4]
C06		EXPLOSIVES; MATCHES
C07		ORGANIC CHEMISTRY [2]
C08		ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
C09		DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
C10		PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
C11		ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
C12		BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
C13		SUGAR INDUSTRY [4]
C14		SKINS; HIDES; PELTS OR LEATHER
C21		METALLURGY
C21		METALLURGY OF IRON
C22		METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
C23		COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL [2]
C23C		COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C 23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D 39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B 41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M 11/83; decorating textiles by locally metallising D06Q 1/04) [4]
C23C 2/00		Coating by applying the coating material in the molten state [4]
C23C 2/00		Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor [4, 2006.01]
C23C 4/00		Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge (build-up welding B23K, e.g. B23K 5/18, B23K 9/04) [4, 2006.01, 2016.01]
C23C 6/00		Coating by casting molten material on the substrate [4, 2006.01]
C23C 8/00		Solid state diffusion into metallic material surfaces [4]
C23C 8/00		Solid state diffusion of only non-metal elements into metallic material surfaces (diffusion of silicon C23C 10/00); Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals (C23C 14/00 takes precedence) [4, 2006.01]
C23C 10/00		Solid state diffusion of only metal elements or silicon into metallic material surfaces [4, 2006.01]
C23C 12/00		Solid state diffusion of at least one non-metal element other than silicon and at least one metal element or silicon into metallic material surfaces [4, 2006.01]
C23C 14/00		Coating by vacuum evaporation, by sputtering or by ion implantation [4]
C23C 14/00		Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material [4, 2006.01]
C23C 16/00		Chemical deposition or plating by decomposition; Contact plating [4]
C23C 16/00		Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes (reactive sputtering or vacuum evaporation C23C 14/00) [4, 2006.01]
C23C 16/01		. on temporary substrates, e.g. on substrates subsequently removed by etching [7, 2006.01]
C23C 16/02		. Pretreatment of the material to be coated (C23C 16/04 takes precedence) [4, 2006.01]
C23C 16/04		. Coating on selected surface areas, e.g. using masks [4, 2006.01]
C23C 16/06		. characterised by the deposition of metallic material [4, 2006.01]
C23C 16/08		. . from metal halides [4, 2006.01]
C23C 16/10		. . . Deposition of chromium only [4, 2006.01]
C23C 16/12		. . . Deposition of aluminium only [4, 2006.01]
C23C 16/14		. . . Deposition of only one other metal element [4, 2006.01]
C23C 16/16		. . from metal carbonyl compounds [4, 2006.01]
C23C 16/18		. . from metallo-organic compounds [4, 2006.01]
C23C 16/20		. . . Deposition of aluminium only [4, 2006.01]
C23C 16/22		. characterised by the deposition of inorganic material, other than metallic material [4, 2006.01]
C23C 16/24		. . Deposition of silicon only [4, 2006.01]
C23C 16/26		. . Deposition of carbon only [4, 2006.01]
C23C 16/27		. . . Diamond only [7, 2006.01]
C23C 16/28		. . Deposition of only one other non-metal element [4, 2006.01]
C23C 16/30		. . Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides [4, 2006.01]
C23C 16/32		. . . Carbides [4, 2006.01]
C23C 16/34		. . . Nitrides [4, 2006.01]
C23C 16/36		. . . Carbo-nitrides [4, 2006.01]
C23C 16/38		. . . Borides [4, 2006.01]
C23C 16/40		. . . Oxides [4, 2006.01]
C23C 16/42		. . . Silicides [4, 2006.01]
C23C 16/44		. characterised by the method of coating (C23C 16/04 takes precedence) [4, 2006.01]
C23C 16/442		. . using fluidised bed processes [7, 2006.01]
C23C 16/448		. . characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials [7, 2006.01]
C23C 16/452		. . . by activating reactive gas streams before introduction into the reaction chamber, e.g. by ionization or by addition of reactive species [7, 2006.01]
C23C 16/453		. . passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD (C23C 16/513 takes precedence; for flame or plasma spraying of coating material in the molten state C23C 4/00) [7, 2006.01]
C23C 16/455		. . characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber [7, 2006.01]
C23C 16/458		. . characterised by the method used for supporting substrates in the reaction chamber [7, 2006.01]
C23C 16/46		. . characterised by the method used for heating the substrate (C23C 16/48, C23C 16/50 take precedence) [4, 2006.01]
C23C 16/48		. . by irradiation, e.g. photolysis, radiolysis, particle radiation [4, 2006.01]
C23C 16/50		. . using electric discharges [4, 2006.01]
C23C 16/503		. . . using dc or ac discharges [7, 2006.01]
C23C 16/505		. . . using radio frequency discharges [7, 2006.01]
C23C 16/507		. . . . using external electrodes, e.g. in tunnel type reactors [7, 2006.01]
C23C 16/509		. . . . using internal electrodes [7, 2006.01]
C23C 16/511		. . . using microwave discharges [7, 2006.01]
C23C 16/513		. . . using plasma jets [7, 2006.01]
C23C 16/515		. . . using pulsed discharges [7, 2006.01]
C23C 16/517		. . . using a combination of discharges covered by two or more of groups C23C 16/503-C23C 16/515 [7, 2006.01]
C23C 16/52		. . Controlling or regulating the coating process [4, 2006.01]
C23C 16/54		. . Apparatus specially adapted for continuous coating [4, 2006.01]
C23C 16/56		. After-treatment [4, 2006.01]
C23C 18/00		Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating [4, 2006.01]
C23C 20/00		Chemical coating by decomposition of either solid compounds or suspensions of the coating forming compounds, without leaving reaction products of surface material in the coating [4, 2006.01]
C23C 22/00
C23C 22/00		Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals [4, 2006.01]
C23C 24/00		Coating starting from inorganic powder (spraying of the coating material in molten state C23C 4/00; solid state diffusion C23C 8/00-C23C 12/00) [4, 2006.01]
C23C 26/00		Coating not provided for in groups C23C 2/00-C23C 24/00 [4, 2006.01]
C23C 28/00		Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of main groups C23C 2/00-C23C 26/00, or by combinations of methods provided for in subclasses C23C and C25D [4, 2006.01]
C23C 30/00		Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process (C23C 26/00, C23C 28/00 take precedence) [4, 2006.01]
C23D		ENAMELLING OF, OR APPLYING A VITREOUS LAYER TO, METALS
C23F		NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES (working of metal by electro-erosion B23H; desurfacing by applying flames B23K 7/00; working metal by laser beam B23K 26/00); INHIBITING CORROSION OF METALLIC MATERIAL; INHIBITING INCRUSTATION IN GENERAL (treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D, C25F); MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 [4]
C23G		CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
C25		ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR [4]
C30		CRYSTAL GROWTH [3]
C40		COMBINATORIAL TECHNOLOGY [2006.01]
C40		COMBINATORIAL TECHNOLOGY [2006.01]
C99		SUBJECT MATTER NOT OTHERWISE PROVIDED FOR IN THIS SECTION [2006.01]
D		TEXTILES; PAPER
E		FIXED CONSTRUCTIONS
F		MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
G		PHYSICS
H		ELECTRICITY

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