54 |
Titel |
TI |
[EN] Optical Aliasing Filter, Pixel Sensor Arrangement and Digital Recording Device |
71/73 |
Anmelder/Inhaber |
PA |
ERNST JUERGEN
;
OBERDOERSTER ALEXANDER
;
SCHOEBERL MICHAEL
|
72 |
Erfinder |
IN |
ERNST JUERGEN, DE
;
OBERDOERSTER ALEXANDER, DE
;
SCHOEBERL MICHAEL, DE
|
22/96 |
Anmeldedatum |
AD |
01.10.2010 |
21 |
Anmeldenummer |
AN |
89661610 |
|
Anmeldeland |
AC |
US |
|
Veröffentlichungsdatum |
PUB |
09.06.2011 |
33 31 32 |
Priorität |
PRC PRN PRD |
EP
09180677
20091223
|
33 31 32 |
PRC PRN PRD |
US
24830509
20091002
|
51 |
IPC-Hauptklasse |
ICM |
H04N 5/335
(2011.01)
|
51 |
IPC-Nebenklasse |
ICS |
|
|
IPC-Zusatzklasse |
ICA |
|
|
IPC-Indexklasse |
ICI |
|
|
Gemeinsame Patentklassifikation |
CPC |
G02B 27/46
|
|
MCD-Hauptklasse |
MCM |
H04N 5/335
(2011.01)
|
|
MCD-Nebenklasse |
MCS |
|
|
MCD-Zusatzklasse |
MCA |
|
57 |
Zusammenfassung |
AB |
[EN] A refraction at a suitably structured surface for example with an arrangement of the same between image plane and mapping optics is used to realize on the one hand a desired aliasing filtering or spatial low-pass filtering on the image plane wherein on the other hand the manufacturing of such structured surfaces may be realized in a cost-effective way. In addition to that, the plate thickness except for the amplitude of the surface structure and aspects of the stability of the plate is of no importance for handling the same, so that the integration into optical systems is facilitated. |
56 |
Entgegengehaltene Patentdokumente/Zitate, in Recherche ermittelt |
CT |
US000004178611A  US000004878737A  US000004998800A  US000005280388A  US000005754342A  US000005755501A  US000006040857A  US000006326998B1  US000007998800B2  US000008228418B2  US020060170797A1  US020070247733A1 
|
56 |
Entgegengehaltene Patentdokumente/Zitate, vom Anmelder genannt |
CT |
|
56 |
Entgegengehaltene Nichtpatentliteratur/Zitate, in Recherche ermittelt |
CTNP |
|
56 |
Entgegengehaltene Nichtpatentliteratur/Zitate, vom Anmelder genannt |
CTNP |
|
|
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Dokumente ermitteln
|
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Sequenzprotokoll |
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Prüfstoff-IPC |
ICP |
G02B 26/08
|