Bibliographic data

Document US020110141446A1 (Pages: 14)

Bibliographic data Document US020110141446A1 (Pages: 14)
INID Criterion Field Contents
54 Title TI [EN] PROJECTION OBJECTIVE
71/73 Applicant/owner PA ZEISS CARL SMT GMBH, DE
72 Inventor IN SCHICKETANZ THOMAS, DE ; WALSER REINHOLD, DE
22/96 Application date AD Nov 22, 2010
21 Application number AN 95121610
Country of application AC US
Publication date PUB Jun 16, 2011
33
31
32
Priority data PRC
PRN
PRD
DE
102009047179
20091126
51 IPC main class ICM G03B 27/54 (2006.01)
51 IPC secondary class ICS G02B 17/06 (2006.01)
IPC additional class ICA
IPC index class ICI
Cooperative patent classification CPC G02B 17/0647
G03F 7/70233
G03F 7/70308
G03F 7/70316
MCD main class MCM G03B 27/54 (2006.01)
MCD secondary class MCS G02B 17/06 (2006.01)
MCD additional class MCA
57 Abstract AB [EN] A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission.
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Sequence listings
Search file IPC ICP G02B 17/06
G03B 27/54