| 54 |
Title |
TI |
[EN] Stencil mask for high - and ultrahigh-energy implantation |
| 71/73 |
Applicant/owner |
PA |
RUEB MICHAEL
|
| 72 |
Inventor |
IN |
RUEB MICHAEL, AT
|
| 22/96 |
Application date |
AD |
Apr 30, 2002 |
| 21 |
Application number |
AN |
13547402 |
|
Country of application |
AC |
US |
|
Publication date |
PUB |
Dec 5, 2002 |
33
31
32 |
Priority data |
PRC
PRN
PRD |
DE
10121181
20010430
|
| 51 |
IPC main class |
ICM |
G03F 9/00
|
| 51 |
IPC secondary class |
ICS |
|
|
IPC additional class |
ICA |
|
|
IPC index class |
ICI |
|
|
Cooperative patent classification |
CPC |
H01L 21/266
Y10T 428/24273
Y10T 428/24322
|
|
MCD main class |
MCM |
|
|
MCD secondary class |
MCS |
H01L 21/266
(2006.01)
|
|
MCD additional class |
MCA |
|
| 57 |
Abstract |
AB |
[EN] A stencil mask for high - and ultrahigh-energy implantation of semiconductor wafers has a substrate with implantation openings through which the implantation energy can be projected onto a wafer that will be implanted. The critical dimension of the implantation openings is defined in a manner dependent on the respective implantation energy. |
| 56 |
Cited documents identified in the search |
CT |
|
| 56 |
Cited documents indicated by the applicant |
CT |
|
| 56 |
Cited non-patent literature identified in the search |
CTNP |
|
| 56 |
Cited non-patent literature indicated by the applicant |
CTNP |
|
|
Citing documents |
|
Determine documents
|
|
Sequence listings |
|
|
|
Search file IPC |
ICP |
G03F 9/00
|
