Bibliografische Daten

Dokument US000010483384B2 (Seiten: 13)

Bibliografische Daten Dokument US000010483384B2 (Seiten: 13)
INID Kriterium Feld Inhalt
54 Titel TI [EN] Transistor device with high current robustness
71/73 Anmelder/Inhaber PA INFINEON TECHNOLOGIES AG, DE
72 Erfinder IN BABURSKE ROMAN, DE ; BHOJANI RITESHKUMAR, DE ; LUTZ JOSEF, DE ; NIEDERNOSTHEIDE FRANZ-JOSEF, DE ; SCHULZE HANS-JOACHIM, DE
22/96 Anmeldedatum AD 22.08.2017
21 Anmeldenummer AN 201715682807
Anmeldeland AC US
Veröffentlichungsdatum PUB 19.11.2019
33
31
32
Priorität PRC
PRN
PRD
DE
102016115801
20160825
51 IPC-Hauptklasse ICM H01L 29/739 (2006.01)
51 IPC-Nebenklasse ICS H01L 27/02 (2006.01)
H01L 29/06 (2006.01)
H01L 29/08 (2006.01)
H01L 29/36 (2006.01)
H03K 17/16 (2006.01)
IPC-Zusatzklasse ICA
IPC-Indexklasse ICI
Gemeinsame Patentklassifikation CPC H01L 27/0222
H01L 29/0603
H01L 29/0619
H01L 29/0684
H01L 29/0696
H01L 29/0834
H01L 29/36
H01L 29/7393
H01L 29/7397
H03K 17/16
MCD-Hauptklasse MCM H01L 29/739 (2006.01)
MCD-Nebenklasse MCS H01L 27/02 (2006.01)
H01L 29/06 (2006.01)
H01L 29/08 (2006.01)
H01L 29/36 (2006.01)
H03K 17/16 (2006.01)
MCD-Zusatzklasse MCA
57 Zusammenfassung AB [EN] A transistor device includes a first emitter region of a first doping type, a second emitter region of a second doping type, a body of the second doping type, a drift region of the first doping type, a field-stop region of the first doping type, at least one boost structure, and a gate electrode. The boost structure is arranged between the field-stop region and the second emitter region. The at least one boost structure includes a base region of the first doping type and at least one auxiliary emitter region of the second doping type separated from the second emitter region by the base region. An overall dopant dose in the drift region and the field-stop region in a current flow direction of the transistor device is higher than a breakthrough charge of a semiconductor material of the drift region and the field-stop region.
56 Entgegengehaltene Patentdokumente/Zitate,
in Recherche ermittelt
CT US020070278472A1
US020100078765A1
US020130264607A1
US020130328105A1
US020140015007A1
US020140209970A1
US020150091053A1
56 Entgegengehaltene Patentdokumente/Zitate,
vom Anmelder genannt
CT DE000010361136A1
DE102005029263A1
DE102007020657A1
DE102013105057A1
DE102014101951A1
DE102015115723A1
56 Entgegengehaltene Nichtpatentliteratur/Zitate,
in Recherche ermittelt
CTNP
56 Entgegengehaltene Nichtpatentliteratur/Zitate,
vom Anmelder genannt
CTNP
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Sequenzprotokoll
Prüfstoff-IPC ICP H01L 29/06
H01L 29/08
H01L 29/36
H03K 17/16