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Dokument US000009625647B2 (Seiten: 60)

Bibliografische Daten Dokument US000009625647B2 (Seiten: 60)
INID Kriterium Feld Inhalt
54 Titel TI [EN] Optoelectronic integrated circuit
71/73 Anmelder/Inhaber PA OPEL SOLAR INC, US ; UNIV CONNECTICUT, US
72 Erfinder IN TAYLOR GEOFF W, US
22/96 Anmeldedatum AD 24.03.2014
21 Anmeldenummer AN 201414222841
Anmeldeland AC US
Veröffentlichungsdatum PUB 18.04.2017
33
31
32
Priorität PRC
PRN
PRD
US
201461962303
20140129
51 IPC-Hauptklasse ICM H01L 29/10 (2006.01)
51 IPC-Nebenklasse ICS G02B 6/134 (2006.01)
H01L 21/8252 (2006.01)
H01L 27/06 (2006.01)
H01L 27/085 (2006.01)
H01L 27/144 (2006.01)
H01L 29/66 (2006.01)
H01L 29/74 (2006.01)
H01L 29/778 (2006.01)
H01L 31/0352 (2006.01)
H01L 31/111 (2006.01)
H01S 5/042 (2006.01)
IPC-Zusatzklasse ICA H01L 33/10 (2010.01)
H01S 5/0625 (2006.01)
H01S 5/062 (2006.01)
H01S 5/10 (2006.01)
H01S 5/20 (2006.01)
H01S 5/22 (2006.01)
H01S 5/30 (2006.01)
H01S 5/343 (2006.01)
IPC-Indexklasse ICI
Gemeinsame Patentklassifikation CPC G02B 6/131
G02B 6/1347
G02B 6/29338
H01S 5/0225
H01S 5/0421
H01S 5/0424
H01S 5/0425
H01S 5/04257
H01S 5/06203
H01S 5/06226
H01S 5/0625
H01S 5/1028
H01S 5/1032
H01S 5/1042
H01S 5/1071
H01S 5/1075
H01S 5/125
H01S 5/183
H01S 5/187
H01S 5/2027
H01S 5/2063
H01S 5/2086
H01S 5/222
H01S 5/3054
H01S 5/309
H01S 5/34313
H10D 18/00
H10D 18/01
H10D 30/4732
H10D 62/141
H10D 62/343
H10D 62/60
H10D 62/815
H10D 84/01
H10D 84/05
H10D 84/82
H10F 30/245
H10F 30/263
H10F 30/2877
H10F 39/103
H10F 71/1272
H10F 77/1248
H10F 77/143
H10F 77/146
H10F 77/413
H10H 20/812
H10H 20/8142
MCD-Hauptklasse MCM H01L 29/10 (2006.01)
MCD-Nebenklasse MCS G02B 6/134 (2006.01)
H01L 21/8252 (2006.01)
H01L 27/06 (2006.01)
H01L 27/085 (2006.01)
H01L 27/144 (2006.01)
H01L 29/66 (2006.01)
H01L 29/74 (2006.01)
H01L 29/778 (2006.01)
H01L 31/0352 (2006.01)
H01L 31/111 (2006.01)
H01S 5/042 (2006.01)
MCD-Zusatzklasse MCA H01L 33/10 (2010.01)
H01S 5/0625 (2006.01)
H01S 5/062 (2006.01)
H01S 5/10 (2006.01)
H01S 5/20 (2006.01)
H01S 5/22 (2006.01)
H01S 5/30 (2006.01)
H01S 5/343 (2006.01)
57 Zusammenfassung AB [EN] A semiconductor device employs an epitaxial layer arrangement including a first ohmic contact layer and first modulation doped quantum well structure disposed above the first ohmic contact layer. The first ohmic contact layer has a first doping type, and the first modulation doped quantum well structure has a modulation doped layer of a second doping type. At least one isolation ion implant region is provided that extends through the first ohmic contact layer. The at least one isolation ion implant region can include oxygen ions. The at least one isolation ion implant region can define a region that is substantially free of charge carriers in order to reduce a characteristic capacitance of the device. A variety of high performance transistor devices (e.g., HFET and BICFETs) and optoelectronic devices can employ this device structure. Other aspects of wavelength-tunable microresonantors and related semiconductor fabrication methodologies are also described and claimed.
56 Entgegengehaltene Patentdokumente/Zitate,
in Recherche ermittelt
CT US000006031243A
US020020121647A1
US020090028492A1
US020100116976A1
US020100236625A1
US020120164797A1
US020140241660A1
56 Entgegengehaltene Patentdokumente/Zitate,
vom Anmelder genannt
CT EP000000452032A2
JP000H06252504A
JP002002217484A
US000004683637A
US000005034958A
US000006479844B2
US000006841795B2
US000006849866B2
US000006853014B2
US000006870207B2
US000006873273B2
US000006954473B2
US000006995407B2
US000007332752B2
US020020191659A1
US020030219045A1
US020140050242A1
WO002002071490A1
WO002013025964A1
56 Entgegengehaltene Nichtpatentliteratur/Zitate,
in Recherche ermittelt
CTNP
56 Entgegengehaltene Nichtpatentliteratur/Zitate,
vom Anmelder genannt
CTNP “Implant Isolation of Gallium Arsenide” Ahmed Shuja, Thesis, School of Electronics, Computing and Mathematics, University of Surrey, May 2002. 1;
“Tunable Bragg reflectors on silicon-on-insulator rib waveguides”, Ivano Giutoni et al., Oct. 12, 2009 / vol. 17, No. 21, Optics Express 18518-18524. 1;
Formation of Buried Insulating Layers in Silicon by the Implantation of High Doses of Oxygen, P.L.F. Hemment, et al., Nuclear Instruments and Methods 209/210 (1983) 157-164. 1;
GaAs-based long-wavelength InAs quantum dots on multi-step-graded InGaAs metamorphic buffer grown by molecular beam epitaxy, He Ji-Fang et al., Journal of Physics D: Applied Physics, J.Phyus. D: Appl.Phys. 44(2011) 335102 (5pp). 1;
Metamorphic growth for application in long-wavelength (1.3-1.55 µm) lasers and MODFET-type structures on GaAs substrates, E.S. Semenova et al., Nanotechnology 15 (2004) S283-S287. 1;
Room temperature operating infrared (8-12 µm) photo detector with InAs quantum dots in modulation doped heterostructures, Taehee Cho et al., IEEE, Dec. 6, 1998, pp. 441-444. 1;
U.S. Appl. No. 08/949,504, Geoff W. Taylor, filed Oct. 19, 1997. 1;
U.S. Appl. No. 09/710,217, Geoff W. Taylor, filed Nov. 11, 2000. 1
Zitierende Dokumente Dokumente ermitteln
Sequenzprotokoll
Prüfstoff-IPC ICP G02B 6/134
H01L 21/332
H01L 21/8252
H01L 27/088
H01L 27/144
H01L 29/06
H01L 29/74
H01L 29/778
H01L 31/0352
H01L 33/10
H01S 5/042
H01S 5/0625
H01S 5/062
H01S 5/10
H01S 5/183
H01S 5/187
H01S 5/20
H01S 5/22
H01S 5/30
H01S 5/343