54 |
Titel |
TI |
[EN] NANOSTRUCTURED FORMS AND LAYERS AND METHOD FOR PRODUCING THEM USING STABLE WATER-SOLUBLE PRECURSORS [XX] Sposób wytwarzania kompozycji do przygotowywania nanostrukturalnych ksztaltek i warstw |
71/73 |
Anmelder/Inhaber |
PA |
INST NEUE MAT GEMEIN GMBH, DE
|
72 |
Erfinder |
IN |
ARPAC ERTUGRUL, TR
;
JONSCHKER GERHARD, DE
;
SCHIRRA HERMANN, DE
;
SCHMIDT HELMUT, DE
|
22/96 |
Anmeldedatum |
AD |
08.04.1999 |
21 |
Anmeldenummer |
AN |
34359099 |
|
Anmeldeland |
AC |
PL |
|
Veröffentlichungsdatum |
PUB |
29.03.2013 |
33 31 32 |
Priorität |
PRC PRN PRD |
DE
19816136
09.04.1998
|
33 31 32 |
PRC PRN PRD |
EP
9902396
08.04.1999
|
51 |
IPC-Hauptklasse |
ICM |
C08G 77/14
(2006.01)
|
51 |
IPC-Nebenklasse |
ICS |
C08G 77/58
(2006.01)
C08L 83/04
(2006.01)
C09D 183/06
(2006.01)
|
|
IPC-Zusatzklasse |
ICA |
|
|
IPC-Indexklasse |
ICI |
|
|
Gemeinsame Patentklassifikation |
CPC |
B82B 3/00
B82Y 20/00
C03C 1/008
C03C 14/00
C03C 17/009
C03C 2214/12
C08G 77/14
C09D 183/04
C09D 4/00
Y10T 428/2995
Y10T 428/31663
|
|
MCD-Hauptklasse |
MCM |
C08K 3/36
(2006.01)
C08G 77/14
(2006.01)
|
|
MCD-Nebenklasse |
MCS |
C03C 1/00
(2006.01)
C03C 14/00
(2006.01)
C03C 17/00
(2006.01)
C08G 77/20
(2006.01)
C08G 77/58
(2006.01)
C08L 83/04
(2006.01)
C09D 183/04
(2006.01)
C09D 183/06
(2006.01)
C09D 183/07
(2006.01)
C09D 4/00
(2006.01)
|
|
MCD-Zusatzklasse |
MCA |
|
57 |
Zusammenfassung |
AB |
[EN] A process for preparing a composition for producing nanostructured mouldings and layers comprises contacting an aqueous and/or alcoholic sol of a compound of an element selected from silicon sand metals of the main groups and transition groups of the Periodic Table with species possessing hydrolysable alkoxy groups and comprising at least one organically modified alkoxysilane or a precondensate derived therefrom, under conditions which lead to (further) hydrolysis of the species, and subsequent removal of the alcohol formed and any alcohol already present originally. The process is characterized in that the alcohol is removed in an amount such that the residual alcohol content of the composition is not more than 20% by weight. |
56 |
Entgegengehaltene Patentdokumente/Zitate, in Recherche ermittelt |
CT |
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56 |
Entgegengehaltene Patentdokumente/Zitate, vom Anmelder genannt |
CT |
|
56 |
Entgegengehaltene Nichtpatentliteratur/Zitate, in Recherche ermittelt |
CTNP |
|
56 |
Entgegengehaltene Nichtpatentliteratur/Zitate, vom Anmelder genannt |
CTNP |
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Prüfstoff-IPC |
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