| 54 |
Titel |
TI |
[DE] Verwendung von mit Oxyalkylenethergruppen modifizierten Epoxypolysiloxanen als Additive für strahlenhärtende Beschichtungen
[EN] Use of oxyalkylenegroup modified epoxypolysiloxanes as an additive for radiation curable coatings
[FR] Utilisation des epoxypolysiloxanes modifiées par des groupes oxyalkyleneether comme additifs pour revêtements durcissables par rayonnement |
| 71/73 |
Anmelder/Inhaber |
PA |
GOLDSCHMIDT AG TH, DE
|
| 72 |
Erfinder |
IN |
BUSCH STEFAN, DE
;
OESTREICH SASCHA DR, DE
;
SILBER STEFAN DR, DE
;
STRUCK SUSANNE, DE
|
| 22/96 |
Anmeldedatum |
AD |
16.04.2002 |
| 21 |
Anmeldenummer |
AN |
02008544 |
|
Anmeldeland |
AC |
EP |
|
Veröffentlichungsdatum |
PUB |
14.07.2004 |
33
31
32 |
Priorität |
PRC
PRN
PRD |
|
| 51 |
IPC-Hauptklasse |
ICM |
C09D 183/06
|
| 51 |
IPC-Nebenklasse |
ICS |
C09D 11/10
C09D 183/12
C09D 7/12
|
|
IPC-Zusatzklasse |
ICA |
|
|
IPC-Indexklasse |
ICI |
|
|
Gemeinsame Patentklassifikation |
CPC |
C08F 283/12
C08F 290/148
C08G 59/3254
C08G 77/46
C09D 11/101
C09D 151/085
|
|
MCD-Hauptklasse |
MCM |
|
|
MCD-Nebenklasse |
MCS |
C08F 283/12
(2006.01)
C08F 290/14
(2006.01)
C08G 59/32
(2006.01)
C08G 77/46
(2006.01)
C09D 11/10
(2006.01)
C09D 151/08
(2006.01)
|
|
MCD-Zusatzklasse |
MCA |
|
| 57 |
Zusammenfassung |
AB |
[EN] Epoxy polysiloxanes which are modified with oxyalkylene ether groups are used as additives to cationically radiation-curable coatings, printing inks and/or print varnishes. The epoxy polysiloxanes contain, attached to a silicon atom of the epoxy polysiloxane, at least one group having oxyalkylene segments. Epoxy polysiloxanes which are modified with oxyalkylene ether groups are used as additives to cationically radiation-curable coatings, printing inks or print varnishes. The epoxy polysiloxanes contain, attached to a silicon atom of the epoxy polysiloxane, at least one group of formula (I) in which it is possible for the oxyalkylene segments -(CnH(2n-m)R4mO-) within one oxyalkylene ether radical to be different from one another and for the sequence of the individual oxyalkylene segments -(CnH(2n-m)R4mO-) to be arbitrary, embracing in particular block copolymers and/or random polymers. -R3-O-(CnH(2n-m)R4mO-)xR5 (I) R3 = divalent optionally substituted 2-11C alkyl or alkylene radical; n = 2-8; m = 0-2n; x = 1-200; R4 = 1-20C alkyl radicals or up to 20C optionally substituted phenyl radicals; R5 = H, optionally substituted 1-6C alkyl radical, acyl radical or -O-CO-NH-R6 radical; R6 = optionally substituted alkyl or aryl radical. |
| 56 |
Entgegengehaltene Patentdokumente/Zitate,
in Recherche ermittelt |
CT |
|
| 56 |
Entgegengehaltene Patentdokumente/Zitate,
vom Anmelder genannt |
CT |
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
in Recherche ermittelt |
CTNP |
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
vom Anmelder genannt |
CTNP |
|
|
Zitierende Dokumente |
|
Dokumente ermitteln
|
|
Sequenzprotokoll |
|
|
|
Prüfstoff-IPC |
ICP |
C09D 11/10
C09D 183/06
C09D 183/12
C09D 7/12
|
