| 54 |
Title |
TI |
[DE] Verfahren zur Bildung einer Isolierschicht und Verfahren zur Herstellung eines Grabenkondensators
[EN] Method of forming an isolation layer and method of manufacturing a trench capacitor
[FR] Procédé de formation d'une couche isolante et méthode de fabrication d'un condensateur enterré |
| 71/73 |
Applicant/owner |
PA |
INFINEON TECHNOLOGIES AG, DE
|
| 72 |
Inventor |
IN |
DRABE CHRISTIAN, DE
;
HAENSEL JANA, DE
;
KRASEMANN ANKE, DE
;
LORENZ BARBARA, DE
;
MORGENSTERN THOMAS DR, DE
;
SCHNEIDER TORSTEN, DE
;
SPULER BRUNO, DE
|
| 22/96 |
Application date |
AD |
Jul 23, 2001 |
| 21 |
Application number |
AN |
01117854 |
|
Country of application |
AC |
EP |
|
Publication date |
PUB |
Sep 29, 2004 |
33
31
32 |
Priority data |
PRC
PRN
PRD |
|
| 51 |
IPC main class |
ICM |
H01L 21/311
|
| 51 |
IPC secondary class |
ICS |
H01L 21/334
H01L 21/8242
H01L 27/108
H01L 29/94
|
|
IPC additional class |
ICA |
|
|
IPC index class |
ICI |
|
|
Cooperative patent classification |
CPC |
H01L 21/31116
H10B 12/038
|
|
MCD main class |
MCM |
|
|
MCD secondary class |
MCS |
H01L 21/311
(2006.01)
H10B 12/00
(2023.01)
|
|
MCD additional class |
MCA |
|
| 57 |
Abstract |
AB |
|
| 56 |
Cited documents identified in the search |
CT |
|
| 56 |
Cited documents indicated by the applicant |
CT |
|
| 56 |
Cited non-patent literature identified in the search |
CTNP |
|
| 56 |
Cited non-patent literature indicated by the applicant |
CTNP |
|
|
Citing documents |
|
Determine documents
|
|
Sequence listings |
|
|
|
Search file IPC |
ICP |
|
