Main content

Bibliographic data

Document DE202020003436U1 (Pages: 4)

Bibliographic data Document DE202020003436U1 (Pages: 4)
INID Criterion Field Contents
54 Title TI [DE] Anlage zum Waschen von Tiefdruckwalzen im Siebdruckbereich
71/73 Applicant/owner PA Daunquart, Alfred, 71711, Steinheim, DE
72 Inventor IN
22/96 Application date AD Aug 11, 2020
21 Application number AN 202020003436
Country of application AC DE
Publication date PUB Oct 22, 2020
33
31
32
Priority data PRC
PRN
PRD


51 IPC main class ICM B41F 35/02 (2006.01)
51 IPC secondary class ICS
IPC additional class ICA
IPC index class ICI
Cooperative patent classification CPC B41F 35/02
MCD main class MCM B41F 35/02 (2006.01)
MCD secondary class MCS
MCD additional class MCA
57 Abstract AB [DE] Anlage (WA) zum Waschen von Gegenständen,insbesondere Tiefdruckwalzen (TW), dadurch gekennzeichnet, dass die Anlage (WA) zwei Rollen-Aufnahmen (RA) zum Einhängen der Tiefdruckwalzen (TW) aufweist.
56 Cited documents identified in the search CT
56 Cited documents indicated by the applicant CT
56 Cited non-patent literature identified in the search CTNP
56 Cited non-patent literature indicated by the applicant CTNP
Citing documents Determine documents
Sequence listings
Search file IPC ICP B41F 35/02