| 54 |
Titel |
TI |
[DE] Verfahren zur Herstellung eines mikrostrukturierten Films und mikrostrukturierter Film
[EN] Producing a microstructured film, comprises hardening a film-forming substance with pore inducer and/or pores partially embedded in the film-forming substance, and structurally applying a supporting substance on the film-forming substance |
| 71/73 |
Anmelder/Inhaber |
PA |
Technische Universität Chemnitz, 09111 Chemnitz, DE
|
| 72 |
Erfinder |
IN |
Baumann, Reinhard, 82152 Krailling, DE
;
Gessner, Thomas, 09113 Chemnitz, DE
;
Goedel, Werner, 09116 Chemnitz, DE
;
Hammerschmidt, Jens, 09113 Chemnitz, DE
;
Jahn, Stephan, 09112 Chemnitz, DE
;
Morschhauser, Andreas, 09126 Chemnitz, DE
;
Nestler, Jörg, 09126 Chemnitz, DE
;
Wachner, Doreen, 09130 Chemnitz, DE
|
| 22/96 |
Anmeldedatum |
AD |
26.01.2009 |
| 21 |
Anmeldenummer |
AN |
102009006064 |
|
Anmeldeland |
AC |
DE |
|
Veröffentlichungsdatum |
PUB |
26.08.2010 |
33
31
32 |
Priorität |
PRC
PRN
PRD |
|
| 51 |
IPC-Hauptklasse |
ICM |
B81C 1/00
(2006.01)
|
| 51 |
IPC-Nebenklasse |
ICS |
B01D 69/10
(2006.01)
B05D 1/26
(2006.01)
B05D 1/38
(2006.01)
B81B 1/00
(2006.01)
C08J 9/00
(2006.01)
|
|
IPC-Zusatzklasse |
ICA |
|
|
IPC-Indexklasse |
ICI |
|
|
Gemeinsame Patentklassifikation |
CPC |
B01D 2323/18
B01D 67/003
B01D 67/0034
B01D 69/10
|
|
MCD-Hauptklasse |
MCM |
B81C 1/00
(2006.01)
|
|
MCD-Nebenklasse |
MCS |
B01D 69/10
(2006.01)
B05D 1/26
(2006.01)
B05D 1/38
(2006.01)
B81B 1/00
(2006.01)
C08J 9/00
(2006.01)
|
|
MCD-Zusatzklasse |
MCA |
|
| 57 |
Zusammenfassung |
AB |
[DE] Die vorliegende Erfindung betrifft ein Verfahren zur Herstellung eines mikrostrukturierten Films mit den folgenden Verfahrensschritten: - Aushärten einer filmbildenden Substanz mit zumindest teilweise in der filmbildenden Substanz eingelagerten Porenbildnern und/oder Poren und - strukturiertes Auftragen einer Stützsubstanz auf die filmbildende Substanz, wobei eine lokale Verformung der filmbildenden Substanz bewirkt wird und/oder auf der filmbildenden Substanz aushärtbare Ablagerungen ausgebildet werden. Ebenso betrifft die vorliegende Erfindung einen mikrostrukturierten Film mit einer filmbildenden Substanz, in die zumindest teilweise Porenbildner und/oder Poren eingelagert sind, wobei die filmbildende Substanz mit stützenden Eigenschaften versehen ist.
[EN] The process for producing a microstructured film (9), comprises hardening a film-forming substance (4) with pore inducer (2) and/or pores (8) partially embedded in the film-forming substance, and structurally applying a supporting substance (7) on the film-forming substance, where a local deformation of the film-forming substance is caused and/or are formed on the film-forming substance of the hardenable deposits. The supporting substance is hardened under the formation of the microstructured film, which contains hardened film-forming substance and hardened supporting substance. The process for producing a microstructured film (9), comprises hardening a film-forming substance (4) with pore inducer (2) and/or pores (8) partially embedded in the film-forming substance, and structurally applying a supporting substance (7) on the film-forming substance, where a local deformation of the film-forming substance is caused and/or are formed on the film-forming substance of the hardenable deposits. The supporting substance is hardened under the formation of the microstructured film, which contains hardened film-forming substance and hardened supporting substance. The film-forming substance is provided with supporting characteristics, in which a hardenable supporting substance and/or a pore-closing substance as supporting substance are applied on the film-forming substance, which partially contains the pores. The pore-closing substance contains a solvent, which partially swells the film-forming substance, is partially evaporated, after which the pores partially closes by the deformation of the film-forming substance, and is partially introduced into the pores and remains in the pores. The pore-closing substance is introduced into the pores and then hardened in it, so that a surface of the hardened pore-closing substance concisely closes with a surface of the hardened film-forming substance. The hardenable supporting substance is applied as pore-closing substance on the surface of the film-forming substance. The hardening of the film-forming substance and the application of the pore-closing substance and/or the hardenable supporting substance on the film-forming substance take place separately from each other in a temporal manner. The pore-closing substance and/or the hardenable supporting substance are discretely or continuously applied on the film-forming substance using an inkjet technology in a drop-shaped manner. The pore-closing substance and/or the hardenable supporting substance are applied on the film-forming substance by a printing process. The film-forming substance is moved in the longitudinal- and/or transverse direction using a pressure head during the application of the pore-closing substance and/or the hardenable supporting substance, where the pressure head is filled with the pore-closing substance and/or the hardenable supporting substance. The pore-closing substance and/or the hardenable supporting substance do not completely cover the film-forming substance, and are applied on the film-forming substance in a honeycomb-shaped- and a cross-shaped manner. For the formation of the pores, the embedded pore inducers are removed from the film-forming substance before applying the pore-closing substance and/or the hardenable supporting substance and from the microstructured film after hardening the supporting substance. The hardenable supporting substance is applied on the film-forming substance in multi-layer coating steps that are temporally separated from each other, and is applied on several layers of the film-forming substance. The application of the film-forming substance and the supporting substance is successively repeated. A first layer of the hardenable supporting substance is applied on the film-forming substance and is partially hardened and a second layer of the hardenable supporting substance is applied on the first layer. The hardenable supporting substance is hardenable oil and monomer and/or polymer, which are provided with solvent and/or photoinitiator, and is applied, so that it forms a lateral structured layer and a continuous structure, which releases the openings, which pass through up to the film-forming substance. The successive applied layers of the hardenable supporting substance are not congruently applied to each other and have a structure divergent from each other. A hierarchical total structure is produced with the non-congruent structure on the film-forming substance by the successive application of the layers of the hardenable supporting substance. The film-forming substance is formed on a water surface. The film-forming substance is removed from the water surface after hardening and then the pore-closing substance and/or the hardenable supporting substance is applied on the film-forming substance. The pore inducer is silica gel particle and a mixture of monomer or polymer, solvent and photoinitiator is applied as film-forming substance on the water surface. For hardening the film-forming substance, the solvent is evaporated and the monomer or polymer is hardened. The silica gel particle is removed from the microstructured film, decomposes by a chemical process and is converted to volatile components in a gas phase reaction. An independent claim is included for a microstructured film. |
| 56 |
Entgegengehaltene Patentdokumente/Zitate,
in Recherche ermittelt |
CT |
DE000003704546C2
DE000060033520T2
DE102006036863A1
DE102007029445A1
|
| 56 |
Entgegengehaltene Patentdokumente/Zitate,
vom Anmelder genannt |
CT |
DE000010058258A1
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
in Recherche ermittelt |
CTNP |
Kuiper, S. et al., J. Membr. Sci., Vol. 150, 1998, S. 1-8 p 0;
Van Rijn, C.J.M. et al., in Nano and Micro Engineered Membrane Technology, Menmbrane Science and Technology (Series 10), Elsevier, Amsterdam, 2003 p 0;
Van Rijn, C.J.M. et al., in Proc. of the workshop of Micro electro Mechanical Systems, IEEE, Amsterdam, 1995, S. 83-87 p 0
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
vom Anmelder genannt |
CTNP |
Kuiper, S.; van Rijn, C. J. M.; Nijdam, W.; Elwenspoek, M. C. J. Membr. Sci. 1998, 150, 1-8. 1;
van Rijn, C. J. M. in Nano and Micro Engineered Membrane Technology, Membrane Science and Technology (Series 10), Elsevier, Amsterdam 2003 1;
van Rijn, C. J. M.; Elwenspoek, M. C. in Proc. of the workshop of Micro Electro Mechanical Systems, IEEE, Amsterdam 1995, 83-87. 1;
van Rijn, C. J. M.; Veldhuis, G. J.; Kuiper, S. Nanotechnology 1998, 9, 343-345 1
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