54 |
Title |
TI |
[DE] Leistungs-MOS-Transistor mit einer SiC-Driftzone und Verfahren zur Herstellung eines Leistungs-MOS-Transistors |
71/73 |
Applicant/owner |
PA |
Infineon Technologies Austria AG, Villach, AT
|
72 |
Inventor |
IN |
Baumgartl, Johannes, Dr., Riegersdorf, AT
;
Rüb, Michael, Dr., Faak am See, AT
;
Treu, Michael, Dr., Villach, AT
|
22/96 |
Application date |
AD |
Sep 30, 2005 |
21 |
Application number |
AN |
102005047054 |
|
Country of application |
AC |
DE |
|
Publication date |
PUB |
Apr 3, 2008 |
33 31 32 |
Priority data |
PRC PRN PRD |
|
51 |
IPC main class |
ICM |
H01L 29/78
(2006.01)
|
51 |
IPC secondary class |
ICS |
H01L 21/336
(2006.01)
|
|
IPC additional class |
ICA |
|
|
IPC index class |
ICI |
|
|
Cooperative patent classification |
CPC |
H10D 12/031
H10D 30/0295
H10D 30/66
H10D 62/111
H10D 62/393
H10D 62/822
H10D 62/8325
|
|
MCD main class |
MCM |
H01L 29/78
(2006.01)
|
|
MCD secondary class |
MCS |
H01L 21/336
(2006.01)
|
|
MCD additional class |
MCA |
|
57 |
Abstract |
AB |
|
56 |
Cited documents identified in the search |
CT |
DE000010130158A1 DE000019641839A1 US000006307232B1 US020040007715A1
|
56 |
Cited documents indicated by the applicant |
CT |
|
56 |
Cited non-patent literature identified in the search |
CTNP |
Patent Abstract of Japan & JP 2003249652 A 0; Patent Abstract of Japan: JP 2003-249 652 A n; Yih, P.H. u.a.: SiC/Si Heterojunction Diodes Fabricated by Self-Selective and by Blanket Rapid Thermal Chemical Vapor Deposition. In: IEEE Transaction on Electron Devices, Vol. 41, No. 3, 1994, S. 281-287 p 0
|
56 |
Cited non-patent literature indicated by the applicant |
CTNP |
|
|
Citing documents |
|
Determine documents
|
|
Sequence listings |
|
|
|
Search file IPC |
ICP |
H01L 21/336 V
H01L 29/78
|