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Bibliographic data Document DE000010260286A1 (Pages: 7)
INID	Criterion	Field	Contents
54	Title	TI	[DE] Verfahren zum Dotieren eines Halbleiterk�rpers [EN] Doping semiconducting body for manufacturing high voltage components involves forming defects by ion implantation of non-doping ions, processing with hydrogen and then annealing
71/73	Applicant/owner	PA	Infineon Technologies AG, 81669 M�nchen, DE
72	Inventor	IN	Niedernostheide, Franz-Josef, Dr., 48157 M�nster, DE ; R�b, Michael, Dr., Faak am See, AT ; Schulze, Hans-Joachim, Dr., 85521 Ottobrunn, DE
22/96	Application date	AD	Dec 20, 2002
21	Application number	AN	10260286
	Country of application	AC	DE
	Publication date	PUB	Aug 19, 2004
33 31 32	Priority data	PRC PRN PRD
51	IPC main class	ICM	H01L 21/322
51	IPC secondary class	ICS	H01L 21/324
	IPC additional class	ICA
	IPC index class	ICI
	Cooperative patent classification	CPC	H01L 21/263 H01L 21/26506 H01L 21/322 H01L 21/3242 H01L 29/0634
	MCD main class	MCM
	MCD secondary class	MCS	H01L 21/263 (2006.01) H01L 21/265 (2006.01) H01L 21/322 (2006.01) H01L 21/324 (2006.01) H01L 29/06 (2006.01)
	MCD additional class	MCA
57	Abstract	AB	[DE] Die Erfindung betrifft ein Verfahren zum Dotieren eines Halbleiterk�rpers durch Erzeugung von Defekten und Ausbildung von mit Wasserstoff korrelierten Defekt-Komplexen, bei dem zur Erzeugung der Defekte nicht dotierend wirkende Ionen, wie insbesondere Heliumionen, verwendet werden, woran sich eine Behandlung mit Wasserstoff und eine Temperierung anschlie�en. [EN] The method involves producing defects and forming defect complexes correlated with hydrogen. The method involves forming defects by ion implantation of non-doping ions, carrying out treatment with hydrogen and then annealing. The hydrogen treatment and annealing are carried out by temperature processing in a hydrogen atmosphere or by hydrogen-plasma processing.
56	Cited documents identified in the search	CT	DE000010025567A1 DE000010245089A1 US000005877070A US000006211041B1 US000006352909B1
56	Cited documents indicated by the applicant	CT
56	Cited non-patent literature identified in the search	CTNP
56	Cited non-patent literature indicated by the applicant	CTNP
	Citing documents		CN000101405847A DE102013106946A1 DE102013106946B4 EP000002058846A1
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	Search file IPC	ICP	H01L 21/322 H01L 21/324