54 |
Title |
TI |
[DE] Verfahren zur Herstellung eines Halbleiterbauelements mit einer Driftzone und einer Feldstoppzone und Halbleiterbauelement mit einer Driftzone und einer Feldstoppzone |
71/73 |
Applicant/owner |
PA |
Infineon Technologies AG, 81669 München, DE
|
72 |
Inventor |
IN |
Rüb, Michael, Dr., Faak a. See, AT
;
Strack, Helmut, Dr., 80804 München, DE
|
22/96 |
Application date |
AD |
Aug 27, 2002 |
21 |
Application number |
AN |
10239312 |
|
Country of application |
AC |
DE |
|
Publication date |
PUB |
Aug 17, 2006 |
33 31 32 |
Priority data |
PRC PRN PRD |
|
51 |
IPC main class |
ICM |
H01L 21/331
(2006.01)
|
51 |
IPC secondary class |
ICS |
H01L 21/336
(2006.01)
H01L 29/739
(2006.01)
H01L 29/78
(2006.01)
|
|
IPC additional class |
ICA |
|
|
IPC index class |
ICI |
|
|
Cooperative patent classification |
CPC |
H01L 21/26513
H01L 21/266
H01L 29/0834
H01L 29/66333
H01L 29/7395
H01L 29/861
|
|
MCD main class |
MCM |
H01L 21/331
(2006.01)
|
|
MCD secondary class |
MCS |
H01L 21/265
(2006.01)
H01L 21/266
(2006.01)
H01L 21/336
(2006.01)
H01L 29/08
(2006.01)
H01L 29/739
(2006.01)
H01L 29/78
(2006.01)
H01L 29/861
(2006.01)
|
|
MCD additional class |
MCA |
|
57 |
Abstract |
AB |
|
56 |
Cited documents identified in the search |
CT |
DE000010000754A1 DE000019731495C2 US000005648283A US000006100169A WO002001020656A2
|
56 |
Cited documents indicated by the applicant |
CT |
|
56 |
Cited non-patent literature identified in the search |
CTNP |
|
56 |
Cited non-patent literature indicated by the applicant |
CTNP |
|
|
Citing documents |
|
Determine documents
|
|
Sequence listings |
|
|
|
Search file IPC |
ICP |
H01L 21/336
H01L 29/78
|