Bibliographic data

Document DE000010143515B4 (Pages: 15)

Bibliographic data Document DE000010143515B4 (Pages: 15)
INID Criterion Field Contents
54 Title TI [DE] Maskenanordnung für einen Abbildungsprozess, Verfahren zu deren Herstellung sowie Verfahren zum optischen Abbilden bzw. zum Herstellen eines Kompensationsbauelements
71/73 Applicant/owner PA Infineon Technologies AG, 81669 München, DE
72 Inventor IN Rüb, Michael, Dr., Faak am See, AT ; Umbach, Frank, 82054 Sauerlach, DE ; Werner, Wolfgang, Dr., 81545 München, DE
22/96 Application date AD Sep 5, 2001
21 Application number AN 10143515
Country of application AC DE
Publication date PUB Sep 7, 2006
33
31
32		 Priority data PRC
PRN
PRD

51 IPC main class ICM G03F 1/16 (2006.01)
51 IPC secondary class ICS
IPC additional class ICA
IPC index class ICI
Cooperative patent classification CPC G03F 1/20
H01L 21/266
H10D 62/111
MCD main class MCM
MCD secondary class MCS G03F 1/20 (2012.01)
H01L 21/266 (2006.01)
H01L 29/06 (2006.01)
MCD additional class MCA
57 Abstract AB
56 Cited documents identified in the search CT DE000010006523A1
DE000010121181A1
US000005756237A
US000006214498B1
56 Cited documents indicated by the applicant CT
56 Cited non-patent literature identified in the search CTNP
56 Cited non-patent literature indicated by the applicant CTNP
Citing documents Determine documents
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Search file IPC ICP G03F 1/16