| 54 |
Titel |
TI |
[EN] NANOSTRUCTURED FORMS AND LAYERS AND METHOD FOR PRODUCING THEM USING STABLE WATER-SOLUBLE PRECURSORS
[FR] CORPS MOULES ET COUCHES NANOSTRUCTURES ET LEUR PRODUCTION A L'AIDE DE PRECURSEURS STABLES SOLUBLES DANS L'EAU |
| 71/73 |
Anmelder/Inhaber |
PA |
INST NEUE MAT GEMEIN GMBH, DE
|
| 72 |
Erfinder |
IN |
ARPAC ERTUGRUL, TR
;
JONSCHKER GERHARD, DE
;
SCHIRRA HERMANN, DE
;
SCHMIDT HELMUT, DE
|
| 22/96 |
Anmeldedatum |
AD |
08.04.1999 |
| 21 |
Anmeldenummer |
AN |
2327312 |
|
Anmeldeland |
AC |
CA |
|
Veröffentlichungsdatum |
PUB |
21.10.1999 |
33
31
32 |
Priorität |
PRC
PRN
PRD |
DE
19816136
09.04.1998
|
33
31
32 |
PRC
PRN
PRD |
EP
9902396
08.04.1999
|
| 51 |
IPC-Hauptklasse |
ICM |
C08G 77/14
|
| 51 |
IPC-Nebenklasse |
ICS |
C08G 77/20
C08G 77/58
C08K 3/36
|
|
IPC-Zusatzklasse |
ICA |
|
|
IPC-Indexklasse |
ICI |
|
|
Gemeinsame Patentklassifikation |
CPC |
B82B 3/00
B82Y 20/00
C03C 1/008
C03C 14/00
C03C 17/009
C03C 2214/12
C08G 77/14
C09D 183/04
C09D 4/00
Y10T 428/2995
Y10T 428/31663
|
|
MCD-Hauptklasse |
MCM |
C08K 3/36
(2006.01)
|
|
MCD-Nebenklasse |
MCS |
C03C 1/00
(2006.01)
C03C 14/00
(2006.01)
C03C 17/00
(2006.01)
C08G 77/14
(2006.01)
C08G 77/20
(2006.01)
C08G 77/58
(2006.01)
C08L 83/04
(2006.01)
C09D 183/04
(2006.01)
C09D 183/07
(2006.01)
C09D 4/00
(2006.01)
|
|
MCD-Zusatzklasse |
MCA |
|
| 57 |
Zusammenfassung |
AB |
[EN] The invention relates to a method for producing a composition for preparing nanostructured forms and layers, consisting of bringing an aqueous and/or alcoholic sol of a compound of an element selected from silicon and the main and sub-group metals into contact with species which have hydrolyzable alkoxy groups and which include at least one organically modified alkoxysilane or a precondensate derived therefrom, in conditions which lead to the (further) hydrolysis of the species and then removing any alcohol which has formed or which may optionally have been present originally. The invention is characterized in that enough alcohol is removed to leave a residual amount of not more than 20 wt.% in the composition. |
| 56 |
Entgegengehaltene Patentdokumente/Zitate,
in Recherche ermittelt |
CT |
|
| 56 |
Entgegengehaltene Patentdokumente/Zitate,
vom Anmelder genannt |
CT |
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
in Recherche ermittelt |
CTNP |
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
vom Anmelder genannt |
CTNP |
|
|
Zitierende Dokumente |
|
Dokumente ermitteln
|
|
Sequenzprotokoll |
|
|
|
Prüfstoff-IPC |
ICP |
C01B 33/141
|
