Bibliographic data

Document US000006756162B2 (Pages: 13)

Bibliographic data Document US000006756162B2 (Pages: 13)
INID Criterion Field Contents
54 Title TI [EN] Stencil mask for high- and ultrahigh-energy implantation
71/73 Applicant/owner PA INFINEON TECHNOPLOGIES AG, DE
72 Inventor IN RUEB MICHAEL, AT
22/96 Application date AD Apr 30, 2002
21 Application number AN 13547402
Country of application AC US
Publication date PUB Jun 29, 2004
33
31
32		 Priority data PRC
PRN
PRD		 DE
10121181
20010430
51 IPC main class ICM G03F 9/00
51 IPC secondary class ICS
IPC additional class ICA
IPC index class ICI
Cooperative patent classification CPC H01L 21/266
Y10T 428/24273
Y10T 428/24322
MCD main class MCM
MCD secondary class MCS H01L 21/266 (2006.01)
MCD additional class MCA
57 Abstract AB [EN] A stencil mask for high- and ultrahigh-energy implantation of semiconductor wafers has a substrate with implantation openings through which the implantation energy can be projected onto a wafer that will be implanted. The critical dimension of the implantation openings is defined in a manner dependent on the respective implantation energy.
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56 Cited documents indicated by the applicant CT US000006187481B1
56 Cited non-patent literature identified in the search CTNP
56 Cited non-patent literature indicated by the applicant CTNP
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