| 54 |
Titel |
TI |
[DE] Verfahren zur Beschichtung von Schüttgütern
[EN] Non-contact coating of bulk materials in powder or granule form with multilayers takes place in vacuum or gas as they fall or fly past metallic vapor deposition sources |
| 71/73 |
Anmelder/Inhaber |
PA |
Parthy, Kai, Dipl.-Ing., 50823 Köln, DE
|
| 72 |
Erfinder |
IN |
|
| 22/96 |
Anmeldedatum |
AD |
17.09.1998 |
| 21 |
Anmeldenummer |
AN |
19842576 |
|
Anmeldeland |
AC |
DE |
|
Veröffentlichungsdatum |
PUB |
23.03.2000 |
33
31
32 |
Priorität |
PRC
PRN
PRD |
|
| 51 |
IPC-Hauptklasse |
ICM |
C23C 14/24
|
| 51 |
IPC-Nebenklasse |
ICS |
C03C 17/09
|
|
IPC-Zusatzklasse |
ICA |
|
|
IPC-Indexklasse |
ICI |
|
|
Gemeinsame Patentklassifikation |
CPC |
C03C 17/09
C03C 2217/25
C03C 2218/15
C04B 41/4584
C04B 41/81
C09C 1/0078
C09C 3/00
C23C 14/22
C23C 14/223
|
|
MCD-Hauptklasse |
MCM |
|
|
MCD-Nebenklasse |
MCS |
C03C 17/09
(2006.01)
C04B 41/45
(2006.01)
C04B 41/81
(2006.01)
C09C 1/00
(2006.01)
C09C 3/00
(2006.01)
C23C 14/22
(2006.01)
|
|
MCD-Zusatzklasse |
MCA |
|
| 57 |
Zusammenfassung |
AB |
[DE] Die Erfindung betrifft ein Verfahren zur kostengünstigen Beschichtung von pulvrigen Substraten, wie z. B. Kunststoff-Granulate, mineralische Pulver, wie Glimmer oder reflektierende Glas-Perlen. DOLLAR A Die Partikel fallen frei beweglich an einer Verdampferquelle vorbei und werden durch die seitliche Abstrahlung der Quelle beschichtet.
[EN] The loose particles or granules fall past or fly over one or more vapor sources in vacuum or gas. Preferred features: Deposition onto the particles from vapor in either atomic or ionic form occurs close to the vapor sources. Particles comprise plastic granules, metal powder, pharmaceutical actives, mineral powder e.g. mica, ceramic powder, glass beads or granules of extremely thin transparent plastic film. Particles are thrown through a flight path above the metal vapor source(s). Particles are introduced into the feed vessel via a vacuum lock. They are coated only on sides facing the source. They are alternatively coated from several sides, passing two or more sources vaporizing the same, or different materials. Particles pass a succession of adjacent sources. Materials are vaporized, at suitable rates. Sources are screened from each other by shades or diaphragms. Sources are electrical resistance-heated metal spirals and boats (vaporization crucibles). Vaporization and deposition are plasma-assisted. Electron beam vaporizers are employed, alternatively cathode sputtering or combinations of the foregoing may be used in the same chamber. Particles are accelerated, preferably by a horizontal conveyor or rotating scatter-disc, to fly over the vapor sources. |
| 56 |
Entgegengehaltene Patentdokumente/Zitate,
in Recherche ermittelt |
CT |
|
| 56 |
Entgegengehaltene Patentdokumente/Zitate,
vom Anmelder genannt |
CT |
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
in Recherche ermittelt |
CTNP |
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
vom Anmelder genannt |
CTNP |
|
|
Zitierende Dokumente |
|
Dokumente ermitteln
|
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Sequenzprotokoll |
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|
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Prüfstoff-IPC |
ICP |
C03C 17/09
C23C 14/24
|
