| 54 |
Titel |
TI |
[EN] PROJECTION OBJECTIVE |
| 71/73 |
Anmelder/Inhaber |
PA |
ZEISS CARL SMT GMBH, DE
|
| 72 |
Erfinder |
IN |
SCHICKETANZ THOMAS, DE
;
WALSER REINHOLD, DE
|
| 22/96 |
Anmeldedatum |
AD |
22.11.2010 |
| 21 |
Anmeldenummer |
AN |
95121610 |
|
Anmeldeland |
AC |
US |
|
Veröffentlichungsdatum |
PUB |
16.06.2011 |
33
31
32 |
Priorität |
PRC
PRN
PRD |
DE
102009047179
20091126
|
| 51 |
IPC-Hauptklasse |
ICM |
G03B 27/54
(2006.01)
|
| 51 |
IPC-Nebenklasse |
ICS |
G02B 17/06
(2006.01)
|
|
IPC-Zusatzklasse |
ICA |
|
|
IPC-Indexklasse |
ICI |
|
|
Gemeinsame Patentklassifikation |
CPC |
G02B 17/0647
G03F 7/70233
G03F 7/70308
G03F 7/70316
|
|
MCD-Hauptklasse |
MCM |
G03B 27/54
(2006.01)
|
|
MCD-Nebenklasse |
MCS |
G02B 17/06
(2006.01)
|
|
MCD-Zusatzklasse |
MCA |
|
| 57 |
Zusammenfassung |
AB |
[EN] A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission. |
| 56 |
Entgegengehaltene Patentdokumente/Zitate,
in Recherche ermittelt |
CT |
US000004268785A
US000004545646A
US000005153898A
US000005911858A
US000005973826A
US000006000798A
US000006014252A
US000006226346B1
US000006262826B1
US000006522716B1
US000006865009B2
US000006927901B2
US000007265531B2
US000007414781B2
US000008194230B2
US000008279404B2
US020020057421A1
US020020129328A1
US020030081722A1
US020030099034A1
US020040051857A1
US020040070743A1
US020060133569A1
US020070132977A1
US020070177274A1
US020080165415A1
US020100195075A1
US020100265481A1
US020130010352A1
|
| 56 |
Entgegengehaltene Patentdokumente/Zitate,
vom Anmelder genannt |
CT |
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
in Recherche ermittelt |
CTNP |
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
vom Anmelder genannt |
CTNP |
|
|
Zitierende Dokumente |
|
Dokumente ermitteln
|
|
Sequenzprotokoll |
|
|
|
Prüfstoff-IPC |
ICP |
G02B 17/06
G03B 27/54
|
