Bibliografische Daten

Dokument US020090032848A1 (Seiten: 29)

Bibliografische Daten Dokument US020090032848A1 (Seiten: 29)
INID Kriterium Feld Inhalt
54 Titel TI [EN] SEMICONDUCTOR DEVICE AND METHOD FOR FORMING SAME
71/73 Anmelder/Inhaber PA INFINEON TECHNOLOGIES AUSTRIA, AT
72 Erfinder IN ELPELT RUDOLF, DE ; RUEB MICHAEL, AT ; RUPP ROLAND, DE ; TREU MICHAEL, AT
22/96 Anmeldedatum AD 30.07.2007
21 Anmeldenummer AN 83054207
Anmeldeland AC US
Veröffentlichungsdatum PUB 05.02.2009
33
31
32
Priorität PRC
PRN
PRD


51 IPC-Hauptklasse ICM H01L 29/808 (2006.01)
51 IPC-Nebenklasse ICS H01L 21/266 (2006.01)
H01L 21/337 (2006.01)
IPC-Zusatzklasse ICA
IPC-Indexklasse ICI
Gemeinsame Patentklassifikation CPC H01L 21/0465
H01L 29/1029
H01L 29/66068
H01L 29/66909
H01L 29/8083
MCD-Hauptklasse MCM H01L 29/808 (2006.01)
MCD-Nebenklasse MCS H01L 21/266 (2006.01)
H01L 21/337 (2006.01)
MCD-Zusatzklasse MCA
57 Zusammenfassung AB [EN] A method for manufacturing a semiconductor device. The method includes providing a semiconductor body of a conductivity type, wherein the semiconductor body comprises a first surface. At least one buried region of a second conductivity type is formed in the semiconductor body and at least a surface region of the second conductivity type is formed at the first surface of the semiconductor body, wherein the buried region and the surface region are formed such that they are spaced apart from each other. The buried region is formed by deep implantation of a first dopant of the second conductivity type.
56 Entgegengehaltene Patentdokumente/Zitate,
in Recherche ermittelt
CT US000006034385A
US000006459108B1
US000006661042B2
US020070114626A1
56 Entgegengehaltene Patentdokumente/Zitate,
vom Anmelder genannt
CT
56 Entgegengehaltene Nichtpatentliteratur/Zitate,
in Recherche ermittelt
CTNP
56 Entgegengehaltene Nichtpatentliteratur/Zitate,
vom Anmelder genannt
CTNP
Zitierende Dokumente Dokumente ermitteln
Sequenzprotokoll
Prüfstoff-IPC ICP H01L 21/265
H01L 21/337
H01L 29/06
H01L 29/78
H01L 29/808