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Erfinder |
IN |
Kolb, Stefan, 85716 Unterschleißheim, DE
;
Rüb, Michael, Faaker See, AT
;
Werner, Wolfgang, 81545 München, DE
|
| 56 |
Entgegengehaltene Nichtpatentliteratur/Zitate,
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CTNP |
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Burrer et al.:"High precision BESOI-based resonantaccelerometer" in Sensors and Actuators A, 1995, Vol. 50, S. 7-12 p 0;
KOVACS, G.T.A. et. a.: Micromachining of Silicon. In: Proceedings, IEEE, Vol. 86, No. 8, Aug. 1998, pp. 1536-51 p 0;
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SATO, TSUTOMU et. al.: A New Substrate Engineering for the formation of Empty Space in Silicon (ESS)... In: IEDM 99, pp. 517-520 p 0;
WEIGOLD, J.W. et.al.: Fabrication of Thick Si Re- sonators with a Frontside Release Etch-Diffusion Process. In: Journal of Microelectromechemical Systems, Vol. 7, No. 2, June 1998, pp. 201-206 p 0
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